Tasuku Matsumiya
at Tokyo Ohka Kogyo Co., Ltd.
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | April 1, 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Semiconductors, Thin films, Lithography, Optical lithography, Etching, Dry etching, Polymers, Annealing, Silicon, Nitrogen, Manufacturing, Control systems, Scanning electron microscopy, Directed self assembly

PROCEEDINGS ARTICLE | March 25, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Lithography, Nanostructures, Polymethylmethacrylate, Annealing, Materials processing, Scanning electron microscopy, Directed self assembly, Picosecond phenomena, Semiconducting wafers, Liquids

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Optical lithography, Polymers, Image processing, Annealing, Error analysis, Coating, Materials processing, Manufacturing, Directed self assembly, Critical dimension metrology

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Environmental monitoring, Deep ultraviolet, Scanners, Reflectivity, Photomasks, Extreme ultraviolet, Aluminum, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 26, 2013
Proc. SPIE. 8680, Alternative Lithographic Technologies V
KEYWORDS: Polymers, Coating, Surface roughness, Atomic force microscopy, Scanning electron microscopy, Surface properties, Directed self assembly, Chemical analysis, Phase measurement, Thin film coatings

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Lithography, Electron beam lithography, Etching, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Failure analysis, Back end of line

Showing 5 of 7 publications
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