Mr. Yutaka Okagawa
Senior Engineer and Marketing Manager at
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Oxides, Metrology, Logic, Statistical analysis, Etching, Germanium, Resistance, Scanning electron microscopy, 3D metrology, Process control, Critical dimension metrology, Algorithm development, Overlay metrology, Standards development, Back end of line

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconductors, Lithography, Optical lithography, Silica, Sensors, Scanners, Manufacturing, Scanning electron microscopy, Photomasks, Semiconductor manufacturing, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | April 27, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Wafer-level optics, Etching, Metals, Scanners, Scanning electron microscopy, Double patterning technology, Semiconducting wafers, Optics manufacturing, Overlay metrology, Tin

PROCEEDINGS ARTICLE | April 8, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Wafer-level optics, Optical lithography, Etching, Image segmentation, Scanners, Scanning electron microscopy, Semiconducting wafers, Overlay metrology, Tin, Back end of line

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Diffraction, Logic, Optical lithography, Etching, Scanners, Scanning electron microscopy, Semiconducting wafers, Overlay metrology, Tin, Back end of line

SPIE Journal Paper | October 6, 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Metrology, Overlay metrology, Calibration, Optical testing, Etching, Inspection, Scanning electron microscopy, Imaging metrology, Electron microscopes, Measurement devices

Showing 5 of 9 publications
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