Dr. Nuriel Amir
Marketing Director at KLA Israel
SPIE Involvement:
Author | Instructor
Publications (12)

Proceedings Article | 16 March 2016 Paper
Chia Ching Lin, En Chuan Lio, Chang Mao Wang, Howard Chen, Sho Shen Lee, Henry Hsing, Kince Liu, Nuriel Amir
Proceedings Volume 9781, 978118 (2016) https://doi.org/10.1117/12.2219509
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Overlay metrology, Etching, Target detection, Time metrology, Imaging metrology, Control systems, Semiconductor manufacturing, Process control

Proceedings Article | 24 March 2015 Paper
Philippe Leray, Ming Mao, Bart Baudemprez, Nuriel Amir
Proceedings Volume 9424, 94240E (2015) https://doi.org/10.1117/12.2087304
KEYWORDS: Overlay metrology, Optical lithography, Etching, Semiconducting wafers, Image segmentation, Distortion, Metrology, Photomasks, Standards development, Silicon

Proceedings Article | 19 March 2015 Paper
Honggoo Lee, Byongseog Lee, Sangjun Han, Myoungsoo Kim, Wontaik Kwon, Sungki Park, DongSub Choi, Dohwa Lee, Sanghuck Jeon, Kangsan Lee, Tal Itzkovich, Nuriel Amir, Roie Volkovich, Eitan Herzel, Mark Wagner, Mohamed El Kodadi
Proceedings Volume 9424, 94242B (2015) https://doi.org/10.1117/12.2085272
KEYWORDS: Overlay metrology, Metrology, Scatterometry, Signal processing, Process control, Quality measurement, Lithography, Double patterning technology, Photomasks, Uncertainty analysis

Proceedings Article | 19 March 2015 Paper
Simon Hsu, Yuan Chi Pai, Charlie Chen, Chun Chi Yu, Henry Hsing, Hsing-Chien Wu, Kelly Kuo, Nuriel Amir
Proceedings Volume 9424, 942409 (2015) https://doi.org/10.1117/12.2085950
KEYWORDS: Scatterometry, Overlay metrology, Photomasks, Metrology, Scatter measurement, Semiconducting wafers, Signal processing, Front end of line, Back end of line, Optical lithography

SPIE Journal Paper | 2 December 2014 Open Access
Wei Jhe Tzai, Simon C. Hsu, Howard Chen, Charlie Chen, Yuan Chi Pai, Chun-Chi Yu, Chia-Ching Lin, Tal Itzkovich, Lipkong Yap, Eran Amit, David Tien, Eros Huang, Kelly T. Kuo, Nuriel Amir
JM3, Vol. 13, Issue 04, 041412, (December 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.041412
KEYWORDS: Metrology, Overlay metrology, Calibration, Optical filters, Etching, Semiconducting wafers, Detection and tracking algorithms, Polishing, Chemical vapor deposition, Chemical mechanical planarization

Showing 5 of 12 publications
Course Instructor
SC1158: Metrology of Image Placement
This course discusses metrology of pattern placement (registration, alignment, and overlay) in IC manufacture. Starting with the definitions of pattern width and placement in design and in patterned materials, this course presents a rigorous approach to dimensional metrology. Going from registration to alignment, then to overlay, it gradually introduces and reviews the key technologies, common applications practices and technology-limiting issues, ultimately deep-diving into optical image- and diffraction-based, and SEM-based overlay metrology. Graphic accounts of metrology-process interactions and key technology learning lead to analysis and discussion, drilling into specific technical details and general methods. Attendees quickly begin to notice applications and technology gaps and to propose solutions, gaining vicarious familiarity with this field, practical understanding of how things work, and of the many factors involved, expanding their outlook. Not required to run a metrology tool in production, this is a prerequisite for successful troubleshooting, engineering change, and development. This course is about foundations of Overlay Applications Track and is intended for attendees interested in anything to do with overlay.
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