Ahmed S. Omran
Member of Technical Staff Engineer
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Publications (5)

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Optical lithography, Data modeling, Manufacturing, Control systems, Neural networks, Machine learning, Optical proximity correction, SRAF, Neurons

PROCEEDINGS ARTICLE | March 16, 2016
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Lithography, Photovoltaics, Logic, Phase modulation, Databases, Printing, Design for manufacturing, Photomasks, Immersion lithography, Optical proximity correction, SRAF, Performance modeling, Model-based design, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Optical lithography, Data modeling, Calibration, Etching, Scanning electron microscopy, Optical proximity correction, Semiconducting wafers, Statistical modeling, Performance modeling

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Logic, Visualization, Manufacturing, Printing, Photomasks, Optical proximity correction, SRAF, Resolution enhancement technologies, Fiber optic illuminators

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Diffraction, Logic, Detection and tracking algorithms, Visualization, Photomasks, Optical proximity correction, Critical dimension metrology, Feedback control, Semiconducting wafers

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