Seung-Hee Baek
at Synopsys Korea Inc
SPIE Involvement:
Publications (9)

Proceedings Article | 23 March 2020 Presentation + Paper
Proceedings Volume 11328, 1132806 (2020)
KEYWORDS: Photomasks, Lithography, Optical proximity correction, Bridges, Data analysis, Semiconducting wafers, Resolution enhancement technologies, SRAF

Proceedings Article | 23 March 2020 Paper
Jiunhau Fu, Chiang Lin Shih, Chun Cheng Liao, Eric Huang, Elsley Tan, John Tsai, Ming Yun Chen, Yuan Pin Liao, Seung Hee Baek
Proceedings Volume 11323, 113232H (2020)
KEYWORDS: Optical proximity correction, Extreme ultraviolet, Molybdenum, Photomasks, Data modeling, Critical dimension metrology, Source mask optimization, Semiconducting wafers, EUV optics, Array processing

Proceedings Article | 28 March 2017 Paper
Bradley Falch, Seung-Hee Baek, John Tsai, Mingchao Ji, Jun Zhu
Proceedings Volume 10148, 101481A (2017)
KEYWORDS: Optical proximity correction, Databases, 3D modeling, Lithography, Photomasks, Computer programming, Design for manufacturability, Manufacturing, Current controlled current source, Environmental sensing

Proceedings Article | 1 October 2013 Paper
Proceedings Volume 8880, 88801U (2013)
KEYWORDS: Optical proximity correction, Image quality, Optimization (mathematics), Nanoimprint lithography, Image enhancement, Image processing, Design for manufacturing, Resolution enhancement technologies, Neodymium, Nano opto mechanical systems

Proceedings Article | 19 May 2008 Paper
Kyoil Koo, Sooryong Lee, Jason Hwang, Daniel Beale, Matt St. John, Robert Lugg, Seunghee Baek, Munhoe Do, Junghoe Choi, Youngchang Kim, Minjong Hong
Proceedings Volume 7028, 70283E (2008)
KEYWORDS: Photomasks, Etching, Optical proximity correction, Data modeling, Semiconducting wafers, Lithography, Statistical modeling, Wafer-level optics, Process modeling, Particles

Showing 5 of 9 publications
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