Dr. Thomas Cecil
Principal Engineer at Synopsys Inc
SPIE Involvement:
Publications (24)

Proceedings Article | 30 April 2023 Presentation
Proceedings Volume 12495, 124951E (2023) https://doi.org/10.1117/12.2657808
KEYWORDS: Machine learning, Lithography, Photomasks, Source mask optimization, Numerical analysis, Convolutional neural networks, Computational lithography

Proceedings Article | 22 March 2021 Presentation + Paper
Proceedings Volume 11613, 116130P (2021) https://doi.org/10.1117/12.2587107
KEYWORDS: Machine learning, Visualization, Optical proximity correction, Neural networks

Proceedings Article | 23 March 2020 Presentation + Paper
Proceedings Volume 11327, 1132706 (2020) https://doi.org/10.1117/12.2551425
KEYWORDS: Data modeling, Photomasks, Lithography, Machine learning, Optical proximity correction, Convolution, Network architectures, Inverse problems, Calibration

Proceedings Article | 24 March 2017 Paper
Stephen Jang, Yunqiang Zhang, Tom Cecil, Howard Cai, Amyn Poonawala, Matt St. John
Proceedings Volume 10147, 101471S (2017) https://doi.org/10.1117/12.2258088
KEYWORDS: Optical proximity correction, Lithography, Photomasks, Computational lithography, Lithium, 193nm lithography, Chemical elements, SRAF

Proceedings Article | 16 March 2016 Paper
Linghui Wu, Denny Kwa, Jinyin Wan, Tom Wang, Matt St. John, Steven Deeth, Xiaohui Chen, Tom Cecil, Xiaodong Meng, Kevin Lucas
Proceedings Volume 9781, 978116 (2016) https://doi.org/10.1117/12.2222591
KEYWORDS: Optical proximity correction, Photomasks, Lithography, Computer programming, Resolution enhancement technologies, Model-based design, Optical lithography, 193nm lithography, Atrial fibrillation, Software development

Showing 5 of 24 publications
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