Jinback Park
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Publications (8)

Proceedings Article | 5 October 2016 Paper
Proceedings Volume 9985, 99851W (2016) https://doi.org/10.1117/12.2241498
KEYWORDS: Extreme ultraviolet, Photomasks, Metrology, Image registration, Overlay metrology, Deep ultraviolet, Reticles, Databases, Calibration, Lithography

Proceedings Article | 27 May 2010 Paper
Jin-Back Park, Kyoung-Yoon Bang, Dong-Gun Lee, Hae-Young Jeong, Seung-Soo Kim, Han-Ku Cho
Proceedings Volume 7748, 77481X (2010) https://doi.org/10.1117/12.868293
KEYWORDS: Extreme ultraviolet, Photomasks, Ruthenium, Data modeling, Etching, Atomic force microscopy, EUV optics, Silicon, Scanning electron microscopy, Critical dimension metrology

Proceedings Article | 17 October 2008 Paper
Kyung-Yoon Bang, Jin-Back Park, Jeong-Hun Roh, Dong-Hoon Chung, Sung-Yong Cho, Yong-Hoon Kim, Sang-Gyun Woo, Han-Ku Cho
Proceedings Volume 7122, 71222V (2008) https://doi.org/10.1117/12.801416
KEYWORDS: Critical dimension metrology, Chromium, Scatterometry, Ultraviolet radiation, Scanning electron microscopy, Optical testing, Scatter measurement, Atomic force microscopy, Process control, Binary data

Proceedings Article | 14 May 2007 Paper
Proceedings Volume 6607, 660720 (2007) https://doi.org/10.1117/12.728983
KEYWORDS: Air contamination, Photomasks, Phase shifts, Electroluminescence, Binary data, Reticles, Semiconducting wafers, Critical dimension metrology, Semiconductors, Crystals

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 63492T (2006) https://doi.org/10.1117/12.685941
KEYWORDS: Air contamination, Photomasks, Critical dimension metrology, Transmittance, Spectroscopic ellipsometry, Lithography, Electroluminescence, Ellipsometry, Semiconductors, Pellicles

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