Kenichi Oyama
at Tokyo Electron Ltd
SPIE Involvement:
Publications (41)

Proceedings Article | 26 May 2022 Presentation + Paper
R. Tsuzuki, X. Liu, K. Oyama
Proceedings Volume 12051, 120510F (2022)
KEYWORDS: Calibration, Extreme ultraviolet, Photoresist processing, Extreme ultraviolet lithography, Data modeling, Stochastic processes, Floods, Electroluminescence, Ultraviolet radiation, Oxides

Proceedings Article | 5 April 2017 Paper
Proceedings Volume 10146, 101461M (2017)
KEYWORDS: Optical lithography, Double patterning technology, Line edge roughness, Carbon, Etching, Silica, Atomic layer deposition, Silicon films, Lithography, Line width roughness

Proceedings Article | 27 March 2017 Paper
Proceedings Volume 10146, 101461N (2017)
KEYWORDS: Extreme ultraviolet, Etching, Process control, Critical dimension metrology, Optical lithography, Lithography, Inspection, Logic, Immersion lithography, Extreme ultraviolet lithography, 193nm lithography

Proceedings Article | 27 March 2017 Presentation + Paper
Proceedings Volume 10143, 1014315 (2017)
KEYWORDS: Extreme ultraviolet, Lithography, Image processing, Edge roughness, Imaging arrays, Extreme ultraviolet lithography, Line edge roughness, Optical lithography, Critical dimension metrology, Stochastic processes, Etching, Logic, Overlay metrology

Proceedings Article | 25 March 2016 Paper
Proceedings Volume 9779, 97791V (2016)
KEYWORDS: Directed self assembly, Optical lithography, Edge roughness, Etching, Atomic layer deposition, Reactive ion etching, Photomasks, Manufacturing, Extreme ultraviolet, Lithography

Showing 5 of 41 publications
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