Dr. Nicolette S. Fender
Sr. Development Engineer at JSR Micro Inc
SPIE Involvement:
Publications (11)

Proceedings Article | 19 March 2012 Paper
Proceedings Volume 8325, 83251B (2012) https://doi.org/10.1117/12.916158
KEYWORDS: Polymers, Reflectivity, Silicon, Semiconducting wafers, Bottom antireflective coatings, Lithography, Chromophores, Critical dimension metrology, Silicon films, Solids

Proceedings Article | 16 April 2011 Paper
Steven Holmes, Cherry Tang, Sean Burns, Yunpeng Yin, Rex Chen, Chiew-seng Koay, Sumanth Kini, Hideyuki Tomizawa, Shyng-Tsong Chen, Nicolette Fender, Brian Osborn, Lovejeet Singh, Karen Petrillo, Guillaume Landie, Scott Halle, Sen Liu, John Arnold, Terry Spooner, Rao Varanasi, Mark Slezak, Matthew Colburn
Proceedings Volume 7972, 79720G (2011) https://doi.org/10.1117/12.881489
KEYWORDS: Photoresist processing, Reactive ion etching, Lithography, Photomasks, Dielectrics, Etching, Scanning electron microscopy, Double patterning technology, Semiconductors, Optical lithography

Proceedings Article | 30 March 2010 Paper
Stefan Harrer, John Arnold, Dario Goldfarb, Steven Holmes, Rex Chen, Cherry Tang, Mark Slezak, Nicolette Fender, Ronald Della Guardia, Eric Joseph, Sebastian Engelmann, Shyng-Tsong Chen, Dave Horak, Yunpeng Yin, Rao Varanasi, Matthew Colburn
Proceedings Volume 7639, 763919 (2010) https://doi.org/10.1117/12.846593
KEYWORDS: Back end of line, Dielectrics, Etching, Lithography, Reactive ion etching, Photoresist materials, Optical lithography, Semiconducting wafers, Copper, Polishing

Proceedings Article | 26 March 2010 Paper
Proceedings Volume 7639, 76392X (2010) https://doi.org/10.1117/12.846891
KEYWORDS: Lithography, Photoresist processing, Semiconducting wafers, Double patterning technology, Semiconductors, Photomasks, Reactive ion etching, Silicon, Scanning electron microscopy, Particles

Proceedings Article | 26 March 2010 Paper
Proceedings Volume 7639, 76390I (2010) https://doi.org/10.1117/12.846443
KEYWORDS: Optical lithography, Einsteinium, Back end of line, Etching, Dielectrics, Semiconducting wafers, Lithography, Photoresist materials, Nanoimprint lithography, Reactive ion etching

Showing 5 of 11 publications
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