PROCEEDINGS VOLUME 4440
INTERNATIONAL SYMPOSIUM ON OPTICAL SCIENCE AND TECHNOLOGY | 29 JULY - 3 AUGUST 2001
Lithographic and Micromachining Techniques for Optical Component Fabrication
Proceedings Volume 4440 is from: Logo
INTERNATIONAL SYMPOSIUM ON OPTICAL SCIENCE AND TECHNOLOGY
29 July - 3 August 2001
San Diego, CA, United States
Micro-Optics
Proc. SPIE 4440, Roadmap for micro-optics fabrication, 0000 (9 November 2001); doi: 10.1117/12.448025
Proc. SPIE 4440, Fabrication of organic photonic crystals for optical wavelengths, 0000 (9 November 2001); doi: 10.1117/12.448035
Proc. SPIE 4440, Thick refractive beam shaping elements applied to laser diodes, 0000 (9 November 2001); doi: 10.1117/12.448044
Proc. SPIE 4440, Beam shaping for multimode beams, 0000 (9 November 2001); doi: 10.1117/12.448054
Microlenses/Beam Shaper I
Proc. SPIE 4440, Fabrication of aspherical microlenses in fused silica and silicon, 0000 (9 November 2001); doi: 10.1117/12.448056
Proc. SPIE 4440, Double-sided hybrid micro-optical elements combining functions of multistage optical systems, 0000 (9 November 2001); doi: 10.1117/12.448057
Proc. SPIE 4440, Quality assurance of HARMS and MOEMS surface structures using confocal white light microscopy, 0000 (9 November 2001); doi: 10.1117/12.448058
Microlenses/Beam Shaper II
Proc. SPIE 4440, Lithographic simulation: a review, 0000 (9 November 2001); doi: 10.1117/12.448059
Proc. SPIE 4440, Fabrication of gray-scale masks and diffractive optical elements with LDW glass, 0000 (9 November 2001); doi: 10.1117/12.448026
Proc. SPIE 4440, Fabrication of glass lenses by melting technology, 0000 (9 November 2001); doi: 10.1117/12.448027
Proc. SPIE 4440, Development of static phase control elements for high-power solid state lasers, 0000 (9 November 2001); doi: 10.1117/12.448028
Computer-Generated Holograms I
Proc. SPIE 4440, Fabrication and applications of large-aperture diffractive optics, 0000 (9 November 2001); doi: 10.1117/12.448029
Proc. SPIE 4440, Testing of aspheric surfaces, 0000 (9 November 2001); doi: 10.1117/12.448030
Proc. SPIE 4440, Testing aspheric surfaces with CGH of different accuracy in industrial manufacturing environs, 0000 (9 November 2001); doi: 10.1117/12.448031
Proc. SPIE 4440, Interferometrical measurement of cylindrical lenses with the help of computer-generated holograms, 0000 (9 November 2001); doi: 10.1117/12.448032
Proc. SPIE 4440, Investigation of large null-CGH realization, 0000 (9 November 2001); doi: 10.1117/12.448033
Computer-Generated Holograms II
Proc. SPIE 4440, Precision cutting processes for manufacturing of optical components, 0000 (9 November 2001); doi: 10.1117/12.448034
Proc. SPIE 4440, Cutting of optical materials by using femtosecond laser pulses, 0000 (9 November 2001); doi: 10.1117/12.448036
Proc. SPIE 4440, Polar-coordinate laser writing systems: error analysis of fabricated DOEs, 0000 (9 November 2001); doi: 10.1117/12.448037
Proc. SPIE 4440, High-resolution digital integral photography using a scanning microlens array, 0000 (9 November 2001); doi: 10.1117/12.448038
Gratings
Proc. SPIE 4440, Subwavelength structure and diffractive optics for optical components in the Joint Research Project for Regional Intensive in Osaka Prefecture, 0000 (9 November 2001); doi: 10.1117/12.448039
Proc. SPIE 4440, Circular dielectric gratings acting as resonators for solid state polymer lasers, 0000 (9 November 2001); doi: 10.1117/12.448040
Proc. SPIE 4440, Minimizing Fizeau fringes during the contact printing of diffraction gratings, 0000 (9 November 2001); doi: 10.1117/12.448041
Proc. SPIE 4440, Microelectronics planar technologies for the manufacturing of high spatial frequency gratings: sub-angstroem assessment of spatial coherence, 0000 (9 November 2001); doi: 10.1117/12.448042
Replication and Transfer
Proc. SPIE 4440, Ion beam and plasma jet etching for optical component fabrication, 0000 (9 November 2001); doi: 10.1117/12.448043
Proc. SPIE 4440, Farbrication of diffractive optical elements on a Si chip by an imprint lithography using nonsymmetrical silicon mold, 0000 (9 November 2001); doi: 10.1117/12.448045
Proc. SPIE 4440, On-chip replication of micro-optical structures for VCSEL to fiber coupling, 0000 (9 November 2001); doi: 10.1117/12.448046
Poster Session
Proc. SPIE 4440, Requirements and approaches to adapting laser writers for fabrication of gray-scale masks, 0000 (9 November 2001); doi: 10.1117/12.448047
Proc. SPIE 4440, Precise proximity correction for fabricating chirped diffraction gratings with direct-writing electron-beam lithography, 0000 (9 November 2001); doi: 10.1117/12.448048
Proc. SPIE 4440, Microrotators fabricated by photolithography, 0000 (9 November 2001); doi: 10.1117/12.448049
Proc. SPIE 4440, Illumination by subwavelength grating with antireflection effect, 0000 (9 November 2001); doi: 10.1117/12.448050
Proc. SPIE 4440, Microretarder array for imaging polarimetry in the visible wavelength region, 0000 (9 November 2001); doi: 10.1117/12.448051
Proc. SPIE 4440, Production of high-order micromachined silicon echelles on optically flat substrates, 0000 (9 November 2001); doi: 10.1117/12.448052
Proc. SPIE 4440, Phase crystallization on the charged surface of viscous media, 0000 (9 November 2001); doi: 10.1117/12.448053
Replication and Transfer
Proc. SPIE 4440, Surface cleaning mechanisms utilizing VUV radiation in oxygen-containing gaseous environments, 0000 (9 November 2001); doi: 10.1117/12.448055
Back to Top