Dr. Arjun Singh
Principal Engineer at GLOBALFOUNDRIES
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | March 28, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Wafer-level optics, Optical lithography, Etching, Image processing, Scanners, Photomasks, Directed self assembly, Optical alignment, Semiconducting wafers

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Semiconductors, Metrology, Data modeling, Image processing, Image analysis, Scanning electron microscopy, Process control, Software development, Algorithm development, Data analysis

PROCEEDINGS ARTICLE | March 22, 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Polymethylmethacrylate, Cadmium, Materials processing, Manufacturing, Photoresist materials, Process control, Directed self assembly, Plasma etching, Critical dimension metrology, Polymer thin films

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Optical lithography, Etching, Image processing, Silicon, Scanning electron microscopy, Photomasks, Directed self assembly, Optical alignment, Semiconducting wafers, System on a chip

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Polymethylmethacrylate, Etching, Photoresist materials, Directed self assembly, Plasma etching, Extreme ultraviolet lithography, Plasma

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Polymethylmethacrylate, Etching, Polymers, Atomic layer deposition, Directed self assembly, Plasma etching, Picosecond phenomena, Line edge roughness, Polymer thin films, Plasma

Showing 5 of 10 publications
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