Dr. Michael J. Leeson
Senior Research Scientist at Intel Corp
SPIE Involvement:
Publications (30)

Proceedings Article | 20 March 2015 Paper
Proceedings Volume 9425, 942516 (2015) https://doi.org/10.1117/12.2086486
KEYWORDS: Line width roughness, Photoresist materials, Photoresist developing, Photoresist processing, Extreme ultraviolet lithography, Semiconducting wafers, Image processing, Extreme ultraviolet, Liquids, Capillaries

Proceedings Article | 19 March 2015 Paper
Proceedings Volume 9424, 94241R (2015) https://doi.org/10.1117/12.2087494
KEYWORDS: Scanning electron microscopy, Atomic force microscopy, Polymers, Imaging systems, Ions, Picosecond phenomena, Scanning helium ion microscopy, Electrons, Photomasks, Neodymium

Proceedings Article | 19 March 2015 Paper
Proceedings Volume 9422, 942205 (2015) https://doi.org/10.1117/12.2086276
KEYWORDS: Extreme ultraviolet, Etching, Photoresist materials, Extreme ultraviolet lithography, Scanning electron microscopy, Particles, Nanoparticles, Semiconducting wafers, Photoresist processing, Chemically amplified resists

Proceedings Article | 17 April 2014 Paper
Proceedings Volume 9048, 904805 (2014) https://doi.org/10.1117/12.2046677
KEYWORDS: Extreme ultraviolet lithography, Nanoparticles, Extreme ultraviolet, Optical lithography, Metals, Spectroscopy, FT-IR spectroscopy, Scanning electron microscopy, Ultraviolet radiation, Particles

Proceedings Article | 23 March 2012 Paper
Proceedings Volume 8322, 83220N (2012) https://doi.org/10.1117/12.916632
KEYWORDS: Photomasks, Surface roughness, Line edge roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Chromium, Reticles, Plasma, High volume manufacturing

Showing 5 of 30 publications
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