Dr. Dominik Metzler
at IBM Corp
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | April 9, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Optical lithography, Etching, Polymers, Dielectrics, Chemistry, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | April 9, 2018
Proc. SPIE. 10589, Advanced Etch Technology for Nanopatterning VII
KEYWORDS: Optical lithography, Etching, Extreme ultraviolet, Line width roughness, Plasma etching, Extreme ultraviolet lithography, Deposition processes, Line edge roughness, Photoresist processing, Plasma

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