Dr. Eric Louis
Senior Scientist at Univ Twente
SPIE Involvement:
Author
Publications (41)

Proceedings Article | 14 May 2019 Presentation
Tomáš Burian, Vera Hájková, Libor Juha, Karel Saksl, Vojtech Vozda, Igor Makhotkin, Eric Louis, Siegfried Schreiber, Kai Tiedtke, Sven Toleikis, Barbara Keitel, Elke Plönjes, Mabel Ruiz-Lopez, Marion Kuhlmann, Thomas Wodzinski, Hartmut Enkisch, Martin Hermann, Sebastian Strobel, Rolf Loch, Ryszard Sobierajski, Iwanna Jacyna, Dorota Klinger, Marek Jurek, Jerzy Pelka, Gosse de Vries, Michael Störmer, Frank Scholze, Frank Siewert, Tobias Mey, Jaromír Chalupský
Proceedings Volume 11035, 110350P (2019) https://doi.org/10.1117/12.2524718
KEYWORDS: X-rays, Optical filters, X-ray lasers, Free electron lasers, Laser ablation, Aluminum, Silicon, Signal attenuation, Extreme ultraviolet, Metals

Proceedings Article | 26 October 2017 Open Access Paper
Benjamin Wylie-van Eerd, Huiyu Yuan, Evert Houwman, Oleksandr Antonov, Eric Louis, Andrey Yakshin, Guus J. H. Rijnders, Fred Bijkerk
Proceedings Volume 9963, 99630N (2017) https://doi.org/10.1117/12.2239018
KEYWORDS: X-ray optics, Adaptive optics, X-rays, Geometrical optics, Alternate lighting of surfaces

Proceedings Article | 26 August 2015 Paper
Dmitry Kuznetsov, Andrey Yakshin, Marko Sturm, Robbert van de Kruijs, Eric Louis, Fred Bijkerk
Proceedings Volume 9588, 958806 (2015) https://doi.org/10.1117/12.2199427
KEYWORDS: Lanthanum, Reflectivity, Interfaces, Local area networks, Mirrors, Nitrogen, Extreme ultraviolet, Optical lithography, X-ray optics, X-rays

Proceedings Article | 17 April 2014 Paper
Qiushi Huang, Meint de Boer, Jonathan Barreaux, Daniel Paardekooper, Toine van den Boogaard, Robbert van de Kruijs, Erwin Zoethout, Eric Louis, Fred Bijkerk
Proceedings Volume 9048, 90480G (2014) https://doi.org/10.1117/12.2046415
KEYWORDS: Extreme ultraviolet, Ultraviolet radiation, Reflectivity, Silicon, Diffraction, Multilayers, Reflection, Extreme ultraviolet lithography, Plasma, Imaging systems

Proceedings Article | 27 September 2013 Paper
I. Makhotkin, R. van de Kruijs, E. Zoethout, E. Louis, F. Bijkerk
Proceedings Volume 8848, 88480O (2013) https://doi.org/10.1117/12.2024199
KEYWORDS: Reflectivity, Multilayers, Mirrors, Lanthanum, Sputter deposition, Lithography, Extreme ultraviolet, Local area networks, Deposition processes, Extreme ultraviolet lithography

Showing 5 of 41 publications
Conference Committee Involvement (9)
Advances in X-Ray/EUV Optics and Components XVII
22 August 2022 | San Diego, California, United States
Advances in X-Ray/EUV Optics and Components XVI
2 August 2021 | San Diego, California, United States
Advances in X-Ray/EUV Optics and Components XV
26 August 2020 | Online Only, California, United States
Advances in X-Ray/EUV Optics and Components XIV
14 August 2019 | San Diego, California, United States
Advances in X-Ray/EUV Optics and Components XIII
20 August 2018 | San Diego, California, United States
Showing 5 of 9 Conference Committees
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