Dr. Luc Martin
Application Engineer at ASELTA Nanographics
SPIE Involvement:
Area of Expertise:
lithography , physics of semi conductors , microelectronics , simulation , programming
Profile Summary

I am a engineer in Physics from INSA Toulouse (National Institute of Applied Sciences FRANCE) graduated in 2007. After my diploma I joined the CEA/LETI laboratory where I prepared a thesis on a new writing strategy for electron beam direct write lithography for future technological nodes.
I am now working as an application engineer at ASELTA Nanographics, a start up company from CEA/LETI. We develop a new data preparation software for e-beam lithography (both direct write and mask making). This software covers the complete litho flow from the layout edition to the wafer map and reticle map. It also provides advanced correction strategies to improve the resolution of e-beam tools and reduce the writing time.
Publications (11)

Proceedings Article | 12 June 2018 Paper
Kenji Kono, Yasuo Kon, Yasunari Tsukino, Sergei Postnikov, Thiago Figueiro, Luc Martin, Paolo Petroni, Patrick Schiavone
Proceedings Volume 10807, 108070A (2018) https://doi.org/10.1117/12.2501785
KEYWORDS: Calibration, Photomasks, Metals, Model-based design, Manufacturing, Etching, Metrology, Critical dimension metrology, Scanning electron microscopy, Electron beam lithography

Proceedings Article | 13 July 2017 Paper
Sébastien Bayle, Charles Tiphine, Matthieu Milléquant, Thiago Figueiro, Luc Martin, Sergei Postnikov, Patrick Schiavone
Proceedings Volume 10454, 104540H (2017) https://doi.org/10.1117/12.2280704
KEYWORDS: Photomasks, Lithography, Model-based design, Optical lithography, Photonics, Algorithm development, Semiconductors, Silicon photonics, Databases, Optical proximity correction

Proceedings Article | 9 September 2013 Paper
Russell Cinque, Tadashi Komagata, Taiichi Kiuchi, Clyde Browning, Patrick Schiavone, Paolo Petroni, Luc Martin, Thomas Quaglio
Proceedings Volume 8880, 88801F (2013) https://doi.org/10.1117/12.2028944
KEYWORDS: Vestigial sideband modulation, Tolerancing, Photomasks, Line edge roughness, Algorithm development, Point spread functions, Printing, Scanning electron microscopy, Critical dimension metrology, Detection and tracking algorithms

Proceedings Article | 28 June 2013 Paper
Patrick Schiavone, Alexandre Chagoya, Luc Martin, Vincent Annezo, Alexis Blanchemain
Proceedings Volume 8701, 87010E (2013) https://doi.org/10.1117/12.2032321
KEYWORDS: Photomasks, Data modeling, Optical proximity correction, Modulation, Neodymium, Model-based design, Image processing, Calibration, Manufacturing, Semiconducting wafers

Proceedings Article | 30 June 2012 Paper
Proceedings Volume 8441, 84411F (2012) https://doi.org/10.1117/12.981609
KEYWORDS: Photomasks, Calibration, Modulation, Manufacturing, Data modeling, Ions, Extreme ultraviolet, Lithography, Scattering, Electroluminescence

Showing 5 of 11 publications
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