Mr. Thiago Figueiro
Application Engineer at Aselta Nanographics
SPIE Involvement:
Author
Profile Summary

Computer engineer with a MSc and PhD in microelectronics, with more than 10 years of combining experiences in the development of EDA and image/signal processing software. Experience in modeling and statistics.
Knowledge on IC design flow, especially on the back-end (standard-cell libraries creation and characterization). Knowledge on Lithography, specially Mask-Dataprep and e-beam mask writing and direct writing.

Specialities: EDA algorithms. Modeling, Image Processing, object modeling and recognition, artificial intelligence. Programming in C++, Perl, Python, C, Java and Matlab.
Publications (13)

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Semiconductors, Lithography, Optical lithography, Databases, Photonics, Photomasks, Optical proximity correction, Silicon photonics, Algorithm development, Model-based design

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Metrology, Data modeling, Calibration, Data processing, Photomasks, Optical proximity correction, Mask making, Critical dimension metrology, Photoresist processing, Process modeling

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Photovoltaics, Point spread functions, Electron beams, Scattering, Calibration, Computer simulations, Cadmium sulfide, Critical dimension metrology, Algorithm development, Semiconducting wafers

PROCEEDINGS ARTICLE | October 29, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Lithography, Electron beam lithography, Manufacturing, Photonic crystals, Printing, Data processing, Photomasks, Photoresist processing, Tolerancing, Vestigial sideband modulation

PROCEEDINGS ARTICLE | October 8, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Lithography, Electron beam lithography, Cadmium, Chromium, Photomasks, Beam shaping, Critical dimension metrology, Neodymium, Photoresist processing, Data corrections

SPIE Journal Paper | August 11, 2014
JM3 Vol. 13 Issue 03
KEYWORDS: Electron beam lithography, Electronic design automation, Critical dimension metrology, Raster graphics, Point spread functions, Semiconducting wafers, Lithography, Modulation, Optical proximity correction, Data conversion

Showing 5 of 13 publications
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