Tadahiko Takikawa
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Publications (22)

Proceedings Article | 8 November 2012 Paper
Takeya Shimomura, Shogo Narukawa, Tsukasa Abe, Tadahiko Takikawa, Naoya Hayashi, Fei Wang, Long Ma, Chia-Wen Lin, Yan Zhao, Chiyan Kuan, Jack Jau
Proceedings Volume 8522, 85220L (2012) https://doi.org/10.1117/12.976017
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Defect detection, Ruthenium, Extreme ultraviolet lithography, Semiconductors, Optical inspection, Reflectivity, Semiconducting wafers

Proceedings Article | 30 June 2012 Paper
Proceedings Volume 8441, 84411F (2012) https://doi.org/10.1117/12.981609
KEYWORDS: Photomasks, Calibration, Modulation, Manufacturing, Data modeling, Ions, Extreme ultraviolet, Lithography, Scattering, Electroluminescence

Proceedings Article | 16 April 2012 Paper
Proceedings Volume 8352, 835204 (2012) https://doi.org/10.1117/12.923125
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Inspection, Line edge roughness, Manufacturing, Defect inspection, EUV optics, Printing, Lithography

Proceedings Article | 7 April 2011 Paper
Proceedings Volume 7969, 79691B (2011) https://doi.org/10.1117/12.879565
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Defect detection, Lithography, Manufacturing, Particles, Electronic components, Opacity

Proceedings Article | 2 April 2011 Paper
Naoya Hayashi, Tsukasa Abe, Takeya Shimomura, Yuichi Inazuki, Tadahiko Takikawa, Hiroshi Mohri
Proceedings Volume 7985, 798505 (2011) https://doi.org/10.1117/12.896886
KEYWORDS: Photomasks, Inspection, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Defect inspection, EUV optics, Reflectivity, Optics manufacturing, Mask cleaning

Showing 5 of 22 publications
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