Dr. Song Lan
at D2S Inc
SPIE Involvement:
Publications (5)

Proceedings Article | 20 March 2018 Paper
Song Lan, Jun Liu, Yumin Wang, Ke Zhao, Jiangwei Li
Proceedings Volume 10587, 105870H (2018) https://doi.org/10.1117/12.2297514
KEYWORDS: Photomasks, Optical proximity correction, SRAF, Optimization (mathematics), Lithography, Image transmission, Image processing, Logic

Proceedings Article | 31 March 2014 Paper
Proceedings Volume 9052, 90520D (2014) https://doi.org/10.1117/12.2047115
KEYWORDS: Semiconducting wafers, Data modeling, Optical proximity correction, Calibration, Optical lithography, Wafer-level optics, Scanning electron microscopy, Photomasks, Modulation, Lithography

Proceedings Article | 8 November 2012 Paper
Sylvain Moulis, Vincent Farys, Jérôme Belledent, Romain Thérèse, Song Lan, Qian Zhao, Mu Feng, Laurent Depre, Russell Dover
Proceedings Volume 8522, 85220A (2012) https://doi.org/10.1117/12.966383
KEYWORDS: Scanning electron microscopy, Data modeling, Atomic force microscopy, Calibration, Data centers, 3D modeling, Lithography, Photoresist processing, Double patterning technology, Electron beam lithography

Proceedings Article | 13 March 2012 Paper
Peng Liu, Zhengfan Zhang, Song Lan, Qian Zhao, Mu Feng, Hua-yu Liu, Venu Vellanki, Yen-wen Lu
Proceedings Volume 8326, 83260A (2012) https://doi.org/10.1117/12.916076
KEYWORDS: 3D modeling, Photomasks, Semiconducting wafers, Performance modeling, Diffusion, Lithography, Data modeling, Optical proximity correction, 3D image processing, Computer simulations

Proceedings Article | 13 March 2012 Paper
Songyi Park, Hyungjoo Youn, Noyoung Chung, Jaeyeol Maeng, Sukjoo Lee, Jahum Ku, Xiaobo Xie, Song Lan, Mu Feng, Venu Vellanki, Joobyoung Kim, Stanislas Baron, Hua-Yu Liu, Stefan Hunsche, Soung-Su Woo, Seung-Hoon Park, Jong-Tai Yoon
Proceedings Volume 8326, 83260O (2012) https://doi.org/10.1117/12.918000
KEYWORDS: Semiconducting wafers, Optical proximity correction, Calibration, Photomasks, Optical lithography, Critical dimension metrology, Data modeling, Silicon, Photoresist materials, Reflection

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