Dr. Song Lan
at XTAL Inc
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Wafer-level optics, Lithography, Optical lithography, Data modeling, Modulation, Calibration, Scanning electron microscopy, Photomasks, Optical proximity correction, Semiconducting wafers

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Lithography, Electron beam lithography, Data modeling, Calibration, 3D modeling, Atomic force microscopy, Scanning electron microscopy, Double patterning technology, Data centers, Photoresist processing

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Optical lithography, Data modeling, Reflection, Calibration, Silicon, Photoresist materials, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Data modeling, Diffusion, Computer simulations, 3D modeling, Photomasks, Optical proximity correction, Semiconducting wafers, Performance modeling, 3D image processing

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top