CONFERENCE PROCEEDINGS
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Dr. Song Lan
at D2S Inc
SPIE Involvement:
Author
Publications (5)
Proceedings Article | 20 March 2018 Paper
Deep learning assisted fast mask optimization
Song Lan, Jiangwei Li, Jun Liu, Yumin Wang, Ke Zhao
Proceedings Volume 10587, 105870H (2018) https://doi.org/10.1117/12.2297514
KEYWORDS: Photomasks, Optical proximity correction, SRAF, Optimization (mathematics), Lithography, Image transmission, Image processing, Logic
Proceedings Article | 31 March 2014 Paper
Wafer sub-layer impact in OPC/ORC models for advanced node implant layers
Proceedings Volume 9052, 90520D (2014) https://doi.org/10.1117/12.2047115
KEYWORDS: Semiconducting wafers, Data modeling, Optical proximity correction, Calibration, Optical lithography, Wafer-level optics, Scanning electron microscopy, Photomasks, Modulation, Lithography
Proceedings Article | 8 November 2012 Paper
A profile-aware resist model with variable threshold
Laurent Depre, Song Lan, Mu Feng, Vincent Farys, Jérôme Belledent, Qian Zhao, Romain Thérèse, Russell Dover, Sylvain Moulis
Proceedings Volume 8522, 85220A (2012) https://doi.org/10.1117/12.966383
KEYWORDS: Scanning electron microscopy, Data modeling, Atomic force microscopy, Calibration, Data centers, 3D modeling, Lithography, Photoresist processing, Double patterning technology, Electron beam lithography
Proceedings Article | 13 March 2012 Paper
A full-chip 3D computational lithography framework
Qian Zhao, Mu Feng, Zhengfan Zhang, Song Lan, Peng Liu, Hua-yu Liu, Venu Vellanki, Yen-wen Lu
Proceedings Volume 8326, 83260A (2012) https://doi.org/10.1117/12.916076
KEYWORDS: 3D modeling, Photomasks, Semiconducting wafers, Performance modeling, Diffusion, Lithography, Data modeling, Optical proximity correction, 3D image processing, Computer simulations
Proceedings Article | 13 March 2012 Paper
Model based OPC for implant layer patterning considering wafer topography proximity (W3D) effects
Hua-Yu Liu, Mu Feng, Song Lan, Soung-Su Woo, Hyungjoo Youn, Sukjoo Lee, Noyoung Chung, Venu Vellanki, Seung-Hoon Park, Songyi Park, Jahum Ku, Joobyoung Kim, Jaeyeol Maeng, Stanislas Baron, Xiaobo Xie, Jong-Tai Yoon, Stefan Hunsche
Proceedings Volume 8326, 83260O (2012) https://doi.org/10.1117/12.918000
KEYWORDS: Semiconducting wafers, Optical proximity correction, Calibration, Photomasks, Optical lithography, Critical dimension metrology, Data modeling, Silicon, Photoresist materials, Reflection
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