Dr. Xiaobo Xie
Senior Engineer at ASML San Jose
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Lithography, Finite-difference time-domain method, Deep ultraviolet, Reflectivity, 3D modeling, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Optical lithography, Data modeling, Reflection, Calibration, Silicon, Photoresist materials, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | August 30, 2006
Proc. SPIE. 6311, Optical Information Systems IV
KEYWORDS: Ultrafast phenomena, Spectrum analysis, Modulation, Polarization, Dispersion, Satellites, Modulators, Signal processing, Picosecond phenomena, Microwave radiation

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