Dr. Xiaobo Xie Profile

Dr. Xiaobo Xie

Senior Engineer at ASML San Jose

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Publications (3)

PROCEEDINGS ARTICLE | April 1, 2013

Fast 3D thick mask model for full-chip EUVL simulations

Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV

KEYWORDS: Lithography, Finite-difference time-domain method, Deep ultraviolet, Reflectivity, 3D modeling, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers

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PROCEEDINGS ARTICLE | March 13, 2012

Model based OPC for implant layer patterning considering wafer topography proximity (W3D) effects

Proc. SPIE. 8326, Optical Microlithography XXV

KEYWORDS: Optical lithography, Data modeling, Reflection, Calibration, Silicon, Photoresist materials, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

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PROCEEDINGS ARTICLE | August 30, 2006

Information processing with spectral decomposition of ultrafast pulses in the time domain

Proc. SPIE. 6311, Optical Information Systems IV

KEYWORDS: Ultrafast phenomena, Spectrum analysis, Modulation, Polarization, Dispersion, Satellites, Modulators, Signal processing, Picosecond phenomena, Microwave radiation

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