Dr. Jun Ye
President and Sales Representative at ASML US Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (14)

PROCEEDINGS ARTICLE | March 30, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Optical lithography, Deep ultraviolet, Sensors, Databases, Manufacturing, Data processing, Design for manufacturing, Extreme ultraviolet, Optical proximity correction, Optical calibration, Model-based design, Process modeling, Standards development

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Optical lithography, Atrial fibrillation, Defect detection, Manufacturing, Photomasks, Source mask optimization, Optical proximity correction, Semiconducting wafers, Model-based design

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Electroluminescence, Printing, Photomasks, Source mask optimization, Optical proximity correction, SRAF, Neodymium, Molybdenum, Astatine, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9053, Design-Process-Technology Co-optimization for Manufacturability VIII
KEYWORDS: Lithography, Photovoltaics, Optical lithography, Source mask optimization, Optical proximity correction, SRAF, Neodymium, Model-based design, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 13, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Diffractive optical elements, Metals, Manufacturing, Electroluminescence, Photomasks, Logic devices, Source mask optimization, SRAF, Fiber optic illuminators

PROCEEDINGS ARTICLE | March 4, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Optical lithography, Scanners, Computer simulations, Transform theory, Process control, Software development, Photomasks, Critical dimension metrology, Optimization (mathematics)

Showing 5 of 14 publications
Conference Committee Involvement (1)
Advanced Microlithography Technologies
8 November 2004 | Beijing, China
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