Alexander Elia
SPIE Involvement:
Area of Expertise:
Optical Measurements on semiconductor devices
Profile Summary

Currently with Global Foundries
Working and collaborating with the integration and device manufacturing teams that are with the GF Alliance partners in developing 20nm & 14nm advanced scatterometry & Optical Metrology solutions.
•Design, execute, and analyze experiments to screen and optimize scatterometry/metrology applications for evaluating new equipment that will meet new technology demands (e.g., performance, yield, and reliability) and manufacturing (e.g., process stability, cost of ownership) targets.
•Engage with equipment suppliers to highlight new scatterometry applications requirements and evaluate new equipment solutions.
•Define and maintain optical metrology applications and equipment roadmaps.
•Transfer technology developed with the alliance partners to the GLOBALFOUNDRIES productions fabs.

M.S. Material Science & Metallurgy 1991
NYU Polytechnic Brooklyn, NY.
Thesis: “ Fabrication of NiAl Intermetallic Composite Coatings by Plasma Spraying”

B.S. Chemistry 1982
C.W. Post College Long Island University, Greenvale, NY

August 2011 – present:
MTS Metrology Process Engineer GLOBALFOUNDRIES East Fishkill & Malta, NY

March 2006 – Aug 2011:
Metrology Process Engineer Tokyo Electron Ltd. East Coast Region

Feb. 2004 to March 2006:
Field Applications Manager Ebara Technologies Inc. East Fishkill, NY

Jan. 1993 to Jan. 2004
Staff Field Process Engineer Lam Research Corporation East Fishkill, NY
Publications (7)

Proceedings Article | 20 March 2020 Presentation + Paper
Padraig Timoney, Roma Luthra, Alex Elia, Haibo Liu, Paul Isbester, Avi Levy, Michael Shifrin, Barak Bringoltz, Ariel Broitman, Eitan Rothstein, Ilya Rubinovich, YongHa Kim, Ofer Shlagman, Barak Ben-Nahum, Marina Zolkin, Igor Turovets, Eylon Rabinovich, Ran Yacoby
Proceedings Volume 11325, 113251H (2020)
KEYWORDS: Metrology, Back end of line, Semiconducting wafers, Scatterometry, Machine learning

SPIE Journal Paper | 14 August 2018
Dhairya Dixit, Nick Keller, Yevgeny Lifshitz, Taher Kagalwala, Alexander Elia, Vinit Todi, Jody Fronheiser, Alok Vaid
JM3, Vol. 17, Issue 03, 034001, (August 2018)
KEYWORDS: Semiconducting wafers, Data modeling, Metrology, Reactive ion etching, Diffractive optical elements, Optics manufacturing, Optical lithography, Scatterometry, Overlay metrology, Transmission electron microscopy

Proceedings Article | 28 March 2017 Presentation + Paper
Jody Fronheiser, Vinit Todi, Yevgeny Lifshitz, Alexander Elia, Dhairya Dixit, Taher Kagalwala, Nick Keller, Fiona Recchia, Alok Vaid
Proceedings Volume 10145, 101451H (2017)
KEYWORDS: Scatterometry, Overlay metrology, Ellipsometry, Spectroscopic ellipsometry, Process control, Critical dimension metrology, Optical metrology, Mueller matrices, Metrology, Transmission electron microscopy, Semiconducting wafers, Diffractive optical elements, Reactive ion etching, 3D modeling, Optics manufacturing, Chemical elements

Proceedings Article | 19 March 2015 Paper
Alok Vaid, Carmen Osorio, Eyal Grubner, Charles Kang, Cornel Bozdog, Padraig Timoney, Alex Elia, Naren Yellai, Toru Ikegami, Masahiko Ikeno
Proceedings Volume 9424, 94241H (2015)
KEYWORDS: Metrology, Critical dimension metrology, Semiconducting wafers, Reactive ion etching, Etching, Data processing, Data communications, Process control, Algorithm development

SPIE Journal Paper | 6 November 2014
Alok Vaid, Alexander Elia, Givantha Iddawela, Cornel Bozdog, Matthew Sendelbach, Byungcheol Kang, Paul Isbester, Shay Wolfling
JM3, Vol. 13, Issue 04, 041410, (November 2014)
KEYWORDS: Line edge roughness, Metrology, Scatterometry, Data modeling, Semiconducting wafers, Critical dimension metrology, Photoresist materials, Transmission electron microscopy, Etching, Scatter measurement

Showing 5 of 7 publications
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