Dr. Narender Rana
at KLA-Tencor
SPIE Involvement:
Conference Program Committee | Author
Publications (18)

Proceedings Article | 21 May 2018 Presentation + Paper
Proceedings Volume 10585, 1058515 (2018) https://doi.org/10.1117/12.2301325
KEYWORDS: Semiconducting wafers, Metrology, Data modeling, Neural networks, Instrument modeling, Magnetism, Principal component analysis, Manufacturing, Process control, Data integration

Proceedings Article | 23 April 2018 Presentation + Paper
Proceedings Volume 10585, 105850Y (2018) https://doi.org/10.1117/12.2300952
KEYWORDS: Inspection, Critical dimension metrology, Metrology, Image classification, Machine learning, Image quality, Manufacturing, Scanning electron microscopy, Image filtering, Neural networks

Proceedings Article | 19 March 2018 Presentation
Proceedings Volume 10585, 1058516 (2018) https://doi.org/10.1117/12.2301328
KEYWORDS: Metrology, Critical dimension metrology, Scanning electron microscopy, Semiconducting wafers, Image processing software, Semiconductor manufacturing, 3D metrology, Process control, Transmission electron microscopy, Manufacturing

Proceedings Article | 13 March 2018 Presentation + Paper
W. Banke, G. Zagorodnev, C. Archie, V. Ukraintsev, N. Rana, V. Pavlovsky, V. Smirnov, I. Briginas, A. Katnani, A. Vaid
Proceedings Volume 10585, 105850W (2018) https://doi.org/10.1117/12.2297065
KEYWORDS: Scanning electron microscopy, Metrology, Data modeling, Optical proximity correction, Critical dimension metrology, Photoresist materials, Scanners, Process modeling, 3D modeling, Optical lithography

Proceedings Article | 19 March 2015 Paper
Narender Rana, Yunlin Zhang, Todd Bailey, Donald Wall, Bachir Dirahoui
Proceedings Volume 9424, 94241I (2015) https://doi.org/10.1117/12.2087406
KEYWORDS: Data modeling, Resistance, Neural networks, Metrology, Semiconducting wafers, Capacitance, Critical dimension metrology, Chemical mechanical planarization, Machine learning, Extreme ultraviolet

Showing 5 of 18 publications
Conference Committee Involvement (8)
Metrology, Inspection, and Process Control XXXVIII
26 February 2024 | San Jose, California, United States
Metrology, Inspection, and Process Control XXXVII
27 February 2023 | San Jose, California, United States
Metrology, Inspection, and Process Control XXXVI
25 April 2022 | San Jose, California, United States
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
22 February 2021 | Online Only, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXIV
24 February 2020 | San Jose, California, United States
Showing 5 of 8 Conference Committees
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