Dr. Dirk Zeidler
Senior Principal / Head of Advanced Development at Carl Zeiss MultiSEM GmbH
SPIE Involvement:
Publications (11)

Proceedings Article | 26 March 2019 Paper
Proceedings Volume 10959, 1095931 (2019) https://doi.org/10.1117/12.2528795
KEYWORDS: Scanning electron microscopy, Sensors, Electron beams, Electron microscopes, Semiconductors, Electron microscopy

Proceedings Article | 28 March 2017 Presentation + Paper
J. T. Neumann, T. Garbowski, W. Högele, T. Korb, S. Halder, P. Leray, R. Garreis, M. le Maire, D. Zeidler
Proceedings Volume 10145, 101451S (2017) https://doi.org/10.1117/12.2257980
KEYWORDS: Scanning electron microscopy, Inspection, Lithography, Defect inspection, Semiconductors, Electron beam lithography, Electron microscopes, Sensors, Optical lithography, Critical dimension metrology, Image quality, Imaging systems

Proceedings Article | 8 March 2016 Paper
Friedhelm Panteleit, Gregor Dellemann, Manuela Gutsch, Christoph Hohle, Matthias Rudolph, Katja Steidel, Xaver Thrun, Dirk Zeidler, Tomasz Garbowski, Elke Reich
Proceedings Volume 9778, 97781V (2016) https://doi.org/10.1117/12.2225501
KEYWORDS: Electrons, Defect inspection, Semiconducting wafers, Scanning electron microscopy, Inspection, Wafer inspection, Semiconductors, Electron beams, Metals, Tin, Electron beam lithography, Image processing, Sensors

Proceedings Article | 4 September 2015 Paper
Maseeh Mukhtar, Kathy Quoi, Matt Malloy, Brad Thiel, Benjamin Bunday, Vibhu Jindal, Stefan Wurm, Thomas Kemen, Dirk Zeidler, Anna Lena Eberle, Tomasz Garbowski, Gregor Dellemann, Jan Hendrik Peters
Proceedings Volume 9661, 96610O (2015) https://doi.org/10.1117/12.2196120
KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Defect inspection, Extreme ultraviolet, Imaging systems, Wafer inspection, Optical inspection, Wafer-level optics, Optics manufacturing

Proceedings Article | 9 July 2015 Paper
Thomas Kemen, Tomasz Garbowski, Dirk Zeidler
Proceedings Volume 9658, 965807 (2015) https://doi.org/10.1117/12.2195705
KEYWORDS: Scanning electron microscopy, Electron beams, Photomasks, Extreme ultraviolet, Inspection, Defect inspection, Semiconducting wafers, Sensors, Image acquisition, Image resolution

Showing 5 of 11 publications
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