Matt Malloy
Metrology Program Manager
Publications (18)

SPIE Journal Paper | 23 August 2016
Maseeh Mukhtar, Benjamin Bunday, Kathy Quoi, Matt Malloy, Brad Thiel
JM3, Vol. 15, Issue 03, 034004, (August 2016)
KEYWORDS: Signal to noise ratio, Electrons, Monte Carlo methods, Silicon, Image processing, Scanning electron microscopy, Sensors, Inspection, Defect inspection, Defect detection

Proceedings Article | 18 March 2016 Paper
Dirk Hellweg, Sascha Perlitz, Krister Magnusson, Renzo Capelli, Markus Koch, Matt Malloy
Proceedings Volume 9776, 97761A (2016)
KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Metrology, Scanners, EUV optics, Particles, Prototyping, Reticles, Electromagnetic coupling

Proceedings Article | 9 November 2015 Paper
Proceedings Volume 9635, 96351D (2015)
KEYWORDS: Extreme ultraviolet, Photomasks, Prototyping, Extreme ultraviolet lithography, Electromagnetic coupling, Metrology, Calibration, Scanners, Image acquisition, Image processing

Proceedings Article | 4 September 2015 Paper
Matt Malloy, Brad Thiel, Benjamin Bunday, Stefan Wurm, Vibhu Jindal, Maseeh Mukhtar, Kathy Quoi, Thomas Kemen, Dirk Zeidler, Anna Lena Eberle, Tomasz Garbowski, Gregor Dellemann, Jan Hendrik Peters
Proceedings Volume 9661, 96610O (2015)
KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Defect inspection, Extreme ultraviolet, Imaging systems, Wafer inspection, Optical inspection, Wafer-level optics, Optics manufacturing

Proceedings Article | 19 March 2015 Paper
Benjamin Bunday, Maseeh Mukhtar, Kathy Quoi, Brad Thiel, Matt Malloy
Proceedings Volume 9424, 94240J (2015)
KEYWORDS: Signal to noise ratio, Silicon, Image processing, Defect inspection, Sensors, Defect detection, Scanning electron microscopy, Inspection, Computer simulations, Optical simulations

Showing 5 of 18 publications
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