Mr. Matt Malloy
Metrology Program Manager
Publications (18)

SPIE Journal Paper | August 23, 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Signal to noise ratio, Electrons, Monte Carlo methods, Silicon, Image processing, Scanning electron microscopy, Sensors, Inspection, Defect inspection, Defect detection

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Reticles, Metrology, Scanners, Particles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Electromagnetic coupling, Prototyping, EUV optics

PROCEEDINGS ARTICLE | November 9, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Metrology, Calibration, Image processing, Scanners, Image acquisition, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Electromagnetic coupling, Prototyping

PROCEEDINGS ARTICLE | September 4, 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Wafer-level optics, Imaging systems, Inspection, Optical inspection, Wafer inspection, Photomasks, Extreme ultraviolet, Semiconducting wafers, Optics manufacturing, Defect inspection

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Manufacturing, Inspection, Optical inspection, Wafer inspection, Photomasks, Extreme ultraviolet, Semiconducting wafers, Optics manufacturing, Prototyping, Defect inspection

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Semiconductors, Signal to noise ratio, Beam splitters, Electron beams, Sensors, Image processing, Microscopy, Image resolution, Scanning electron microscopy, Brain

Showing 5 of 18 publications
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