Dr. Lewis Flanagin
Design Engineer
SPIE Involvement:
Area of Expertise:
photolithography , optical proximity correction , design for manufacturability , process development , resolution enhancement technology
Profile Summary

Experienced chemical process engineer in research and advanced technology development. Extensive background in model formulation and computer simulation. Adept at technical writing and presentations. Manifested ability to interact with international business partners. Proven team leadership and effectiveness in training others. Demonstrated flexibility across engineering disciplines.
Publications (7)

Proceedings Article | 17 March 2008 Paper
Proceedings Volume 6925, 69250E (2008) https://doi.org/10.1117/12.774581
KEYWORDS: Lithography, SRAF, Photomasks, Logic, Optical proximity correction, Lithographic illumination, Printing, Critical dimension metrology, Design for manufacturing, Model-based design

Proceedings Article | 14 March 2006 Paper
Proceedings Volume 6156, 615614 (2006) https://doi.org/10.1117/12.660600
KEYWORDS: Data modeling, Optical proximity correction, Scanning electron microscopy, SRAF, Semiconducting wafers, Photomasks, Image filtering, Process modeling, Error analysis, Data processing

Proceedings Article | 24 August 2001 Paper
Sean Burns, Allen Gardiner, Val Krukonis, Paula Wetmore, Jodie Lutkenhaus, Gerard Schmid, Lewis Flanagin, C. Grant Willson
Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436876
KEYWORDS: Polymers, Oxygen, Surface roughness, Picture Archiving and Communication System, Medium wave, Polymer thin films, Photoresist materials, Ionization, FT-IR spectroscopy, Oxidation

Proceedings Article | 23 June 2000 Paper
Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388354
KEYWORDS: Polymers, Computer simulations, Molecules, Diffusion, Lithography, Monte Carlo methods, Photoresist materials, Performance modeling, Deep ultraviolet, Polymer thin films

Proceedings Article | 29 June 1998 Paper
Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312345
KEYWORDS: Polymers, Ionization, Hydrogen, Photoresist materials, Diffusion, Deep ultraviolet, Chromophores, Photoresist developing, Polarization, Ions

Showing 5 of 7 publications
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