Timothy Lin
SPIE Involvement:
Publications (15)

SPIE Journal Paper | 2 December 2013
JM3, Vol. 13, Issue 01, 011004, (December 2013) https://doi.org/10.1117/12.10.1117/1.JMM.13.1.011004
KEYWORDS: Photomasks, Semiconducting wafers, 3D modeling, Optical proximity correction, Critical dimension metrology, Calibration, Photoresist materials, Computational lithography, Data modeling, Mathematical modeling

Proceedings Article | 12 April 2013 Paper
Proceedings Volume 8683, 868307 (2013) https://doi.org/10.1117/12.2013748
KEYWORDS: Photomasks, Semiconducting wafers, Optical proximity correction, 3D modeling, Calibration, Critical dimension metrology, Manufacturing, Process modeling, Data modeling, Computational lithography

Proceedings Article | 30 June 2012 Paper
Timothy Lin, Jed Rankin, Yuki Fujita, Adam Smith, Emile Sahouria, Ahmad Elayat, Peter Thwaite, Steffen Schulze
Proceedings Volume 8441, 84411E (2012) https://doi.org/10.1117/12.978836
KEYWORDS: Photomasks, Inspection, Line edge roughness, Critical dimension metrology, Manufacturing, Source mask optimization, Semiconducting wafers, Diffusion, Visualization, Lithography

Proceedings Article | 17 April 2012 Paper
Proceedings Volume 8352, 83520J (2012) https://doi.org/10.1117/12.923675
KEYWORDS: Photomasks, Optical proximity correction, Lithography, Inspection, Semiconducting wafers, Manufacturing, Model-based design, Data processing, Resolution enhancement technologies, Forward error correction

Proceedings Article | 14 October 2011 Paper
Proceedings Volume 8166, 816634 (2011) https://doi.org/10.1117/12.902443
KEYWORDS: Photomasks, Optical proximity correction, Data modeling, Inspection, Manufacturing, Semiconducting wafers, Optical alignment, Lithography, Model-based design, Forward error correction

Showing 5 of 15 publications
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