Dr. Ricardo Ruiz
Research Technologist at Western Digital
SPIE Involvement:
Conference Program Committee | Author | Instructor
Publications (11)

SPIE Journal Paper | October 4, 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Directed self assembly, Lithography, Electron beam lithography, Extreme ultraviolet lithography, Optical lithography, Extreme ultraviolet, Process control, Integrated circuit design, Nanostructures, Nanoimprint lithography

SPIE Journal Paper | September 11, 2015
JM3 Vol. 14 Issue 03
KEYWORDS: Lithography, Optical lithography, Nanofabrication, Extreme ultraviolet lithography, Nanotechnology, Nanoimprint lithography, Silver, Extreme ultraviolet, Integrated circuit design, Directed self assembly

SPIE Journal Paper | October 3, 2014
JM3 Vol. 13 Issue 03
KEYWORDS: Lithography, Optical lithography, Electron beam lithography, Nanotechnology, Extreme ultraviolet lithography, Photomasks, Integrated circuit design, Double patterning technology, Nanolithography, Directed self assembly

SPIE Journal Paper | September 30, 2013
JM3 Vol. 12 Issue 03
KEYWORDS: Lithography, High volume manufacturing, Extreme ultraviolet lithography, Optical lithography, Overlay metrology, Explosives, Metrology, Roads, Molecular self-assembly, Directed self assembly

SPIE Journal Paper | August 7, 2012
JM3 Vol. 11 Issue 3
KEYWORDS: Nanoimprint lithography, Chromium, Reactive ion etching, Lithography, Silicon, Double patterning technology, Electron beam lithography, Polymethylmethacrylate, Magnetism, Directed self assembly

PROCEEDINGS ARTICLE | March 21, 2012
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Lithography, Optical lithography, Etching, Silicon, Chromium, Directed self assembly, Double patterning technology, Reactive ion etching, Beam propagation method, Plasma

Showing 5 of 11 publications
Conference Committee Involvement (13)
Advanced Etch Technology for Nanopatterning VII
26 February 2018 | San Jose, California, United States
Novel Patterning Technologies 2018
26 February 2018 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning VI
27 February 2017 | San Jose, California, United States
Emerging Patterning Technologies 2017
27 February 2017 | San Jose, California, United States
Alternative Lithographic Technologies VIII
22 February 2016 | San Jose, California, United States
Showing 5 of 13 published special sections
Course Instructor
SC1067: Directed Self Assembly and its Application to Nanoscale Fabrication
This course explains basic principles and applications of directed self assembly (DSA), with particular emphasis on block copolymer directed self assembly. A primary goal of the course is to present in a systematic manner the central issues that govern directed self assembly, and to do so in a way that will enable current and future practicioners of directed self assembly to rapidly identify the potential and limitations of this technique for specific applications. Anyone who wants to answer questions such as, "what structures can I create, how robust are certain processes, or what materials should I employ" will benefit from taking this course.
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