Robert Boone
Manager, Machine Learning at ASML
SPIE Involvement:
Publications (10)

Proceedings Article | 23 March 2020 Presentation + Paper
Changsoo Kim, Seungjong Lee, Sangwoo Park, No-Young Chung, Jungmin Kim, Narae Bang, Sanghwa Lee, SooRyong Lee, Robert Boone, Pengcheng Li, Jiyoon Chang, Xinxin Zhou, YoungMi Kim, MinSu Oh, Minsung Kim, Rachit Gupta, Jun Ye, Stanislas Baron
Proceedings Volume 11323, 1132317 (2020)
KEYWORDS: Data modeling, Optical proximity correction, Performance modeling, Neural networks, Image processing, Machine learning, Lithography, Extreme ultraviolet, Photoresist processing, Statistical modeling

Proceedings Article | 14 March 2006 Paper
Proceedings Volume 6156, 61560R (2006)
KEYWORDS: Resolution enhancement technologies, Optical proximity correction, Process modeling, Error analysis, Image processing, Semiconducting wafers, Reticles, Optical lithography, Photomasks, Model-based design

Proceedings Article | 5 November 2005 Paper
Proceedings Volume 5992, 59920R (2005)
KEYWORDS: Etching, Optical lithography, Photomasks, Quartz, Phase shifts, Printing, Electroluminescence, Manufacturing, Chromium, Optical proximity correction

Proceedings Article | 5 May 2005 Paper
Proceedings Volume 5756, (2005)
KEYWORDS: Model-based design, Optical proximity correction, Optical lithography, Data modeling, Lithography, Systems modeling, Semiconductors, Resolution enhancement technologies, Reticles, Semiconducting wafers

Proceedings Article | 6 December 2004 Paper
Proceedings Volume 5567, (2004)
KEYWORDS: Resolution enhancement technologies, Error analysis, Data modeling, Statistical modeling, Statistical analysis, Databases, Semiconductors, Optical proximity correction, Photomasks, Product engineering

Showing 5 of 10 publications
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