Seokhan Kim
at Nearfield Instruments BV
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 10 April 2024 Poster
Proceedings Volume 12955, 129552U (2024) https://doi.org/10.1117/12.3010488
KEYWORDS: Semiconducting wafers, High volume manufacturing, Metrology, Copper, Chemical mechanical planarization, Surface finishing, Semiconductor manufacturing, Process control, Miniaturization, Atomic force microscopy

Proceedings Article | 10 April 2024 Poster
Proceedings Volume 12955, 1295531 (2024) https://doi.org/10.1117/12.3010719
KEYWORDS: Extreme ultraviolet lithography, Metrology, 3D metrology, Nondestructive evaluation, Line width roughness, Atomic force microscopy, Surface roughness, Photoresist materials, Line edge roughness, Algorithm development

Proceedings Article | 10 April 2024 Poster
Proceedings Volume 12955, 129552T (2024) https://doi.org/10.1117/12.3010482
KEYWORDS: Metrology, Semiconducting wafers, Copper, Chemical mechanical planarization, Surface roughness, High volume manufacturing, Atomic force microscopy, Wafer bonding, Wafer testing, System integration

Proceedings Article | 16 September 2022 Paper
M. Mucientes, A. Khachaturiants, R. Trussell, A. Kalinin, Y. Guo, E. Simons, S. Kim, O. Nadyarnykh, A. Moussa, J. Bogdanowicz, J. Severi, G. Lorusso, D. De Simone, A.-L. Charley, P. Leray, M. van Reijzen, C. Bozdog, H. Sadeghian
Proceedings Volume 12325, 123250M (2022) https://doi.org/10.1117/12.2641698
KEYWORDS: Scanning probe microscopy, Semiconducting wafers, Metrology, Optical lithography, Bridges, Extreme ultraviolet lithography, Defect inspection, Photoresist materials, Inspection, Atomic force microscopy

Proceedings Article | 13 June 2022 Presentation
Artem Khatchaturiants, Marta Mucientes, Arseniy Kalinin, Yan Guo, Seokhan Kim, Alain Moussa, Janusz Bogdanowicz, Joren Severi, Gian Lorusso, Danilo De Simone, Anne-Laure Charley, Philippe Leray, Maarten van Reijzen, Cornel Bozdog, Hamed Sadeghian
Proceedings Volume PC12053, PC120530I (2022) https://doi.org/10.1117/12.2616089
KEYWORDS: Scanning probe microscopy, Metrology, Photoresist materials, Extreme ultraviolet lithography, Scanning probe metrology, Profiling, Process control, Extreme ultraviolet, Atomic force microscopy, Stochastic processes

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