Ms. Martha I. Sanchez
Advisory Engineer at IBM Research - Almaden
SPIE Involvement:
Conference Program Committee | Conference Co-Chair | Conference Chair | Editor | Author
Publications (36)

PROCEEDINGS ARTICLE | April 13, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Oxides, Optical lithography, Polymethylmethacrylate, Etching, Metals, Scanning electron microscopy, Extreme ultraviolet, Directed self assembly, Picosecond phenomena, Critical dimension metrology

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Metals, Silicon, Manufacturing, Extreme ultraviolet, Directed self assembly, Plasma etching, Optical alignment, Critical dimension metrology, Line edge roughness, Nanofabrication

PROCEEDINGS ARTICLE | April 4, 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Lithography, Optical lithography, Polymethylmethacrylate, Etching, Extreme ultraviolet, Directed self assembly, Picosecond phenomena, Critical dimension metrology, Semiconducting wafers, Global Positioning System

PROCEEDINGS ARTICLE | April 1, 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Semiconductors, Lithography, Polymethylmethacrylate, Scattering, Chemistry, Atomic force microscopy, Monte Carlo methods, Surface properties, Directed self assembly, Integrated circuits, Picosecond phenomena

Showing 5 of 36 publications
Conference Committee Involvement (16)
Novel Patterning Technologies 2018
26 February 2018 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXII
26 February 2018 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXI
27 February 2017 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXX
22 February 2016 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXIX
23 February 2015 | San Jose, California, United States
Showing 5 of 16 published special sections
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