Martha I. Sanchez
Senior Engr.
SPIE Involvement:
Conference Program Committee | Editorial Board Member: Journal of Micro/Nanolithography, MEMS, and MOEMS | Editorial Board Member: Journal of Micro/Nanopatterning, Materials, and Metrology | Author | Editor
Publications (38)

SPIE Journal Paper | 22 November 2021 Open Access
JM3, Vol. 20, Issue 04, 041401, (November 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.4.041401
KEYWORDS: Photomasks, Lithography, Extreme ultraviolet, Semiconducting wafers, Printing, Line edge roughness, High volume manufacturing

SPIE Journal Paper | 2 March 2021 Open Access
William Hinsberg, Gregory Wallraff, Martha Sanchez, Nimrod Megiddo, Oleg Kostko
JM3, Vol. 20, Issue 01, 014603, (March 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.1.014603
KEYWORDS: Stochastic processes, Printing, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist materials, Photon counting, Monte Carlo methods, Chemistry, Polymers, Bridges

Proceedings Article | 26 September 2019 Paper
Proceedings Volume 11147, 1114717 (2019) https://doi.org/10.1117/12.2537632
KEYWORDS: Stochastic processes, Printing, Extreme ultraviolet, Photoresist materials, Extreme ultraviolet lithography, Polymers, Photoresist processing, Lithography, Polymer thin films, Molecules

Proceedings Article | 25 March 2019 Presentation
Gregory Wallraff, Wyatt Thornley, Oleg Kostko, Dan Slaughter, Frank Ogletree, Hoa Truong, Martha Sanchez, Noel Arellno, Alexander Friz
Proceedings Volume 10960, 1096004 (2019) https://doi.org/10.1117/12.2514610
KEYWORDS: Metals, Photoresist materials, Extreme ultraviolet, Systems modeling, Electrons, Extreme ultraviolet lithography, High volume manufacturing, Semiconductor manufacturing, Semiconductors, Photoresist processing

Proceedings Article | 25 March 2019 Presentation
Hoa Truong, Martha Sanchez, Daniel Sanders, Gregory Wallraff, Oleg Kostko, D. Frank Ogletree, Daniel Slaughter, Wyatt Thornley
Proceedings Volume 10960, 1096005 (2019) https://doi.org/10.1117/12.2515134
KEYWORDS: Extreme ultraviolet, Metals, Manufacturing, Semiconductor manufacturing, Semiconductors, Resolution enhancement technologies, Photoresist materials, Extreme ultraviolet lithography, Thermal modeling, Photochemistry

Showing 5 of 38 publications
Proceedings Volume Editor (7)

Showing 5 of 7 publications
Conference Committee Involvement (23)
Novel Patterning Technologies 2024
26 February 2024 | San Jose, California, United States
Novel Patterning Technologies 2023
27 February 2023 | San Jose, California, United States
Novel Patterning Technologies 2022
25 April 2022 | San Jose, California, United States
Novel Patterning Technologies 2021
22 February 2021 | Online Only, California, United States
Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
24 February 2020 | San Jose, California, United States
Showing 5 of 23 Conference Committees
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