Ms. Martha I. Sanchez Profile

Martha I. Sanchez

Senior Engr.

SPIE Involvement:

Conference Program Committee | Editorial Board Member: Journal of Micro/Nanolithography, MEMS, and MOEMS | Editorial Board Member: Journal of Micro/Nanopatterning, Materials, and Metrology | Author | Editor

Publications (38)

SPIE Journal Paper | 22 November 2021 Open Access

Special Section Guest Editorial: Masks and Lithography in the Era of Multi-beam Mask Writers

Alan Brodie, Martha Sanchez

JM3, Vol. 20, Issue 04, 041401, (November 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.4.041401

KEYWORDS: Photomasks, Lithography, Extreme ultraviolet, Semiconducting wafers, Printing, Line edge roughness, High volume manufacturing

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SPIE Journal Paper | 2 March 2021 Open Access

Contribution of EUV resist counting statistics to stochastic printing failures

William Hinsberg, Gregory Wallraff, Martha Sanchez, Nimrod Megiddo, Oleg Kostko

JM3, Vol. 20, Issue 01, 014603, (March 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.1.014603

KEYWORDS: Stochastic processes, Printing, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist materials, Photon counting, Monte Carlo methods, Chemistry, Polymers, Bridges

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Proceedings Article | 26 September 2019 Paper

An analysis of EUV resist stochastic printing failures

M. Sanchez, G. Wallraff, N. Megiddo, W. Hinsberg

Proceedings Volume 11147, 1114717 (2019) https://doi.org/10.1117/12.2537632

KEYWORDS: Stochastic processes, Printing, Extreme ultraviolet, Photoresist materials, Extreme ultraviolet lithography, Polymers, Photoresist processing, Lithography, Polymer thin films, Molecules

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Proceedings Article | 25 March 2019 Presentation

Model studies on the metal salt sensitization of chemically amplified photoresists (Conference Presentation)

Gregory Wallraff, Hoa Truong, Martha Sanchez, Noel Arellno, Alexander Friz, Wyatt Thornley, Oleg Kostko, Dan Slaughter, Frank Ogletree

Proceedings Volume 10960, 1096004 (2019) https://doi.org/10.1117/12.2514610

KEYWORDS: Metals, Photoresist materials, Extreme ultraviolet, Systems modeling, Electrons, Extreme ultraviolet lithography, High volume manufacturing, Semiconductor manufacturing, Semiconductors, Photoresist processing

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Proceedings Article | 25 March 2019 Presentation

Model reactivity of inorganic and organometallic materials in EUV (Conference Presentation)

Wyatt Thornley, Hoa Truong, Martha Sanchez, Daniel Sanders, Gregory Wallraff, Oleg Kostko, D. Frank Ogletree, Daniel Slaughter

Proceedings Volume 10960, 1096005 (2019) https://doi.org/10.1117/12.2515134

KEYWORDS: Extreme ultraviolet, Metals, Manufacturing, Semiconductor manufacturing, Semiconductors, Resolution enhancement technologies, Photoresist materials, Extreme ultraviolet lithography, Thermal modeling, Photochemistry

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SPIE Journal Paper | 1 October 2018 Open Access

Special Section Guest Editorial: Novel Patterning Technologies

Eric Panning, Martha Sanchez

JM3, Vol. 17, Issue 03, 031201, (October 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.3.031201

KEYWORDS: Optical lithography, 3D displays, 3D acquisition, Directed self assembly, Nanoimprint lithography, Microopto electromechanical systems, Packaging, Semiconductors, Nanostructures, Light emitting diodes

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Proceedings Article | 13 April 2017 Presentation + Paper

Electrical study of DSA shrink process and CD rectification effect at sub-60nm using EUV test vehicle

Cheng Chi, Chi-Chun Liu, Luciana Meli, Jing Guo, Doni Parnell, Yann Mignot, Kristin Schmidt, Martha Sanchez, Richard Farrell, Lovejeet Singh, Tsuyoshi Furukawa, Kafai Lai, Yongan Xu, Daniel Sanders, David Hetzer, Andrew Metz, Sean Burns, Nelson Felix, John Arnold, Daniel Corliss

Proceedings Volume 10146, 101460Q (2017) https://doi.org/10.1117/12.2260454

KEYWORDS: Etching, Directed self assembly, Polymethylmethacrylate, Critical dimension metrology, Picosecond phenomena, Oxides, Scanning electron microscopy, Optical lithography, Extreme ultraviolet, Metals

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Proceedings Article | 27 March 2017 Paper

DSA patterning options for logics and memory applications

Chi-Chun Liu, Elliott Franke, Yann Mignot, Scott LeFevre, Stuart Sieg, Cheng Chi, Luciana Meli, Doni Parnell, Kristin Schmidt, Martha Sanchez, Lovejeet Singh, Tsuyoshi Furukawa, Indira Seshadri, Ekmini Anuja De Silva, Hsinyu Tsai, Kafai Lai, Hoa Truong, Richard Farrell, Robert Bruce, Mark Somervell, Daniel Sanders, Nelson Felix, John Arnold, David Hetzer, Akiteru Ko, Andrew Metz, Matthew Colburn, Daniel Corliss

Proceedings Volume 10146, 1014603 (2017) https://doi.org/10.1117/12.2260479

KEYWORDS: Directed self assembly, Plasma etching, Optical lithography, Etching, Logic, Lithography, Manufacturing, Nanofabrication, Silicon, Metals, Extreme ultraviolet, Line edge roughness, Optical alignment, Critical dimension metrology

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Proceedings Article | 4 April 2016 Paper

DSA via hole shrink for advanced node applications

Cheng Chi, Chi-Chun Liu, Luciana Meli, Kristin Schmidt, Yongan Xu, Ekmini Anuja DeSilva, Martha Sanchez, Richard Farrell, Hongyun Cottle, Daiji Kawamura, Lovejeet Singh, Tsuyoshi Furukawa, Kafai Lai, Jed Pitera, Daniel Sanders, David Hetzer, Andrew Metz, Nelson Felix, John Arnold, Matthew Colburn

Proceedings Volume 9777, 97770L (2016) https://doi.org/10.1117/12.2219706

KEYWORDS: Directed self assembly, Polymethylmethacrylate, Picosecond phenomena, Etching, Global Positioning System, Critical dimension metrology, Optical lithography, Lithography, Extreme ultraviolet, Semiconducting wafers

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Proceedings Article | 1 April 2016 Paper

Strategies to enable directed self-assembly contact hole shrink for tight pitches

Kristin Schmidt, Hitoshi Osaki, Kota Nishino, Martha Sanchez, Chi-Chun Liu, Tsuyoshi Furukawa, Cheng Chi, Jed Pitera, Nelson Felix, Daniel Sanders

Proceedings Volume 9777, 97771U (2016) https://doi.org/10.1117/12.2219213

KEYWORDS: Surface properties, Integrated circuits, Semiconductors, Monte Carlo methods, Directed self assembly, Picosecond phenomena, Polymethylmethacrylate, Chemistry, Atomic force microscopy, Scattering, Lithography

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Proceedings Article | 17 October 2014 Paper

Characterization of a new polarity switching negative tone e-beam resist for 14nm and 10nm logic node mask fabrication and beyond

T. Faure, A. Zweber, L. Bozano, M. Sanchez, R. Sooriyakumaran, L. Sundberg, Y. Sakamoto, S. Nash, M. Kagawa, T. Isogawa, T. Senna, M. Tanabe, T. Komizo, I. Yoshida, K. Masunaga, S. Watanabe, Y. Kawai, J. Malenfant, R. Bowley

Proceedings Volume 9235, 92350P (2014) https://doi.org/10.1117/12.2069031

KEYWORDS: Etching, Opacity, Switching, SRAF, Dry etching, Critical dimension metrology, Logic, Scanning electron microscopy, Manufacturing, Image resolution

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Proceedings Article | 27 March 2014 Paper

ICE: Ionic contrast enhancement for organic solvent negative tone develop

Linda Sundberg, Gregory Wallraff, Luisa Bozano, Hoa Truong, Martha Sanchez, Dario Goldfarb, Karen Petrillo, William Hinsberg

Proceedings Volume 9051, 90510S (2014) https://doi.org/10.1117/12.2046762

KEYWORDS: Image processing, Ions, Photoresist processing, Semiconducting wafers, Polymers, Lithium, Standards development, Lithography, Image quality standards, Reflectivity

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Proceedings Article | 9 September 2013 Paper

Defects on high-resolution negative-tone resist: "The revenge of the blobs"

M. Sanchez, L. Sundberg, L. Bozano, R. Sooriyakumaran, D. Sanders, T. Senna, M. Tanabe, T. Komizo, I. Yoshida, A. Zweber

Proceedings Volume 8880, 88800V (2013) https://doi.org/10.1117/12.2028753

KEYWORDS: Photomasks, Semiconducting wafers, Inspection, Switching, Chromium, Switches, Silicon, Ultraviolet radiation, Lamps, Optical microscopes

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Proceedings Article | 29 March 2013 Paper

Monitoring the evolution of line edge roughness during resist development using an analog of quenched flow kinetics

M. Sanchez, L. Sundberg, G. Wallraff, W. Hinsberg, L. Bozano, H. Truong, K. Petrillo

Proceedings Volume 8682, 868218 (2013) https://doi.org/10.1117/12.2010966

KEYWORDS: Line edge roughness, Scanning electron microscopy, Analog electronics, Glasses, Extreme ultraviolet, Photoresist processing, Resist chemistry, Photoresist materials, Semiconducting wafers, Photomicroscopy

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Proceedings Article | 8 November 2012 Paper

Conductive layer for charge dissipation during electron-beam exposures

Luisa Bozano, Ratnam Sooriyakumaran, Takayuki Nagasawa, Satoshi Watanabe, Yoshio Kawai, Shinpei Kondo, Jun Kotani, Masayuki Kagawa, Linda Sundberg, Martha Sanchez, Elizabeth Lofano, Charles Rettner, Tasuku Senna, Thomas Faure

Proceedings Volume 8522, 85220O (2012) https://doi.org/10.1117/12.977181

KEYWORDS: Image quality, Photomasks, Semiconducting wafers, Polymers, Electron beam lithography, Line edge roughness, Image registration, Photoresist processing, Neodymium, Ions

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Proceedings Article | 8 November 2012 Paper

Study and comparison of negative tone resists for fabrication of bright field masks for 14nm node

Amy Zweber, Tom Faure, Anne McGuire, Linda Sundberg, Ratnam Sooriyakumaran, Martha Sanchez, Luisa Bozano, Tasuku Senna, Yuki Fujita, Yoshiyuki Negishi, Masahito Tanabe, Takahiro Kaneko

Proceedings Volume 8522, 85220S (2012) https://doi.org/10.1117/12.976878

KEYWORDS: Photomasks, Line edge roughness, SRAF, Manufacturing, Opacity, Critical dimension metrology, Phase shifts, Binary data, Photoresist processing, Electron beam lithography

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Proceedings Article | 23 March 2012 Paper

EUV mask line edge roughness

Amy Zweber, Emily Gallagher, Martha Sanchez, Tasuku Senna, Yoshiyuki Negishi, Toshio Konishi, Anne McGuire, Luisa Bozano, Phil Brock, Hoa Truong

Proceedings Volume 8322, 83220O (2012) https://doi.org/10.1117/12.916291

KEYWORDS: Line edge roughness, Photomasks, Extreme ultraviolet, Scanning electron microscopy, Semiconducting wafers, Edge detection, Image filtering, EUV optics, Pixel resolution, Line width roughness

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Proceedings Article | 20 March 2012 Paper

Conductive layer for charge dissipation during electron-beam exposures

Luisa Bozano, Ratnam Sooriyakumaran, Linda Sundberg, Martha Sanchez, Elizabeth Lofano, Charles Rettner, Takayuki Nagasawa, Satoshi Watanabe, Yoshio Kawai, Nagarajan Palavesam, Gustavo Gandara Montano

Proceedings Volume 8325, 83250X (2012) https://doi.org/10.1117/12.916756

KEYWORDS: Image quality, Polymers, Semiconducting wafers, Gold, Electron beams, Resistance, Lithography, Chemically amplified resists, Thin film coatings, Neodymium

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Proceedings Article | 16 April 2011 Paper

Bound PAG resists: an EUV and electron beam lithography performance comparison of fluoropolymers

Luisa Bozano, Phillip Brock, Hoa Truong, Martha Sanchez, Gregory Wallraff, William Hinsberg, Robert Allen, Masaki Fujiwara, Kazuhiko Maeda

Proceedings Volume 7972, 797218 (2011) https://doi.org/10.1117/12.884519

KEYWORDS: Extreme ultraviolet, Polymers, Extreme ultraviolet lithography, Electron beam lithography, Lithography, Spectroscopy, Line edge roughness, Image resolution, Glasses, Atomic force microscopy

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Proceedings Article | 22 March 2007 Paper

Impact of curing kinetics and materials properties on imprint characteristics of resists for UV nano-imprint lithography

Frances Houle, Ann Fornof, Ratnam Sooriyakumaran, Hoa Truong, Dolores Miller, Martha Sanchez, Blake Davis, Teddie Magbitang, Robert Allen, Mark Hart, Geraud Dubois

Proceedings Volume 6519, 65191C (2007) https://doi.org/10.1117/12.712298

KEYWORDS: Ultraviolet radiation, Fluorine, Polymers, Glasses, Silicon, Polymerization, Data conversion, Scanning electron microscopy, Dielectrics, Materials processing

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Proceedings Article | 4 May 2005 Paper

Studies of acid diffusion in low Ea chemically amplified photoresists

G. Wallraff, D. Medeiros, C. Larson, M. Sanchez, Karen Petrillo, Wu-Song Huang, C. Rettner, B. Davis, Linda Sundberg, William Hinsberg, F. Houle, J. Hoffnagle, Dario Goldfarb, K. Temple, J. Bucchignano

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.601759

KEYWORDS: Diffusion, Absorption, Photoresist materials, Polymers, Humidity, Lithography, Extreme ultraviolet lithography, Image resolution, Infrared imaging, Photoresist processing

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Proceedings Article | 28 May 2004 Paper

Fast calculation of images for high numerical aperture lithography

Alan Rosenbluth, Gregg Gallatin, Ronald Gordon, William Hinsberg, John Hoffnagle, Frances Houle, Kafai Lai, Alexey Lvov, Martha Sanchez, Nakgeuon Seong

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537716

KEYWORDS: Polarization, Photomasks, Diffraction, Birefringence, System on a chip, Lithography, Optical proximity correction, Image processing, Modulation transfer functions, Thin films

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Proceedings Article | 14 May 2004 Paper

Liquid immersion lithography: evaluation of resist issues

William Hinsberg, Gregory Wallraff, Carl Larson, Blake Davis, Vaughn Deline, Simone Raoux, Dolores Miller, Frances Houle, John Hoffnagle, Martha Sanchez, Charles Rettner, Linda Sundberg, David Medeiros, Ralph Dammel, Willard Conley

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536576

KEYWORDS: Liquids, Polymers, Diffusion, Lithography, Immersion lithography, Polymer thin films, Imaging systems, Neodymium, Semiconducting wafers, Absorption

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Proceedings Article | 12 June 2003 Paper

Does line-edge roughness matter?: FEOL and BEOL perspectives

Qinghuang Lin, Charles Black, Christophe Detavernier, Lynne Gignac, Kathryn Guarini, Brian Herbst, Hyungjun Kim, Philip Oldiges, Karen Petrillo, Martha Sanchez

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.487736

KEYWORDS: Line edge roughness, Copper, Transistors, Atomic layer deposition, Silicon, Back end of line, Surface roughness, Tantalum, Front end of line, Plasma

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Proceedings Article | 12 June 2003 Paper

Using the critical ionization model for resist development to estimate contrast curves and roughening

Frances Houle, William Hinsberg, Martha Sanchez

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485131

KEYWORDS: Polymers, Ionization, Polymer thin films, Systems modeling, Line edge roughness, Photoresist processing, Photoresist materials, Chemically amplified resists, Statistical modeling, Computer simulations

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Proceedings Article | 12 June 2003 Paper

Impact of thin resist processes on post-etch LER

Arpan Mahorowala, Dario Goldfarb, Karen Temple, Karen Petrillo, Dirk Pfeiffer, Katherina Babich, Marie Angelopoulos, Gregg Gallatin, Stacy Rasgon, Herbert Sawin, Scott Allen, Robert Lang, Margaret Lawson, Ranee Kwong, Kuang-Jung Chen, Wenjie Li, Pushkara Varanasi, Martha Sanchez, Hiroshi Ito, Gregory Wallraff, Robert Allen

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485168

KEYWORDS: Etching, Oxides, Scanning electron microscopy, Line edge roughness, Atomic force microscopy, Polymers, Plasma, Plasma etching, Chemistry, Photoresist processing

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Proceedings Article | 12 June 2003 Paper

Extendibility of chemically amplified resists: another brick wall?

William Hinsberg, Frances Houle, Martha Sanchez, John Hoffnagle, Gregory Wallraff, David Medeiros, Gregg Gallatin, Jonathan Cobb

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.487739

KEYWORDS: Lithography, Image resolution, Polymers, Diffusion, Semiconductors, Photoresist processing, Image processing, Chemically amplified resists, Line edge roughness, Molecules

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Proceedings Article | 2 June 2003 Paper

Characterization of photoresist spatial resolution by interferometric lithography

John Hoffnagle, William Hinsberg, Frances Houle, Martha Sanchez

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.485015

KEYWORDS: Modulation transfer functions, Photoresist materials, Interferometry, Spatial resolution, Lithography, Modulation, Spatial frequencies, Deep ultraviolet, Photoresist developing, Optical lithography

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SPIE Journal Paper | 1 October 2002

High numerical aperture lithographic imagery at Brewster's angle

Timothy Brunner, Nakgeuon Seong, William Hinsberg, John Hoffnagle, Frances Houle, Martha Sanchez

JM3, Vol. 1, Issue 03, (October 2002) https://doi.org/10.1117/12.10.1117/1.1507337

KEYWORDS: Lithography, Polarization, Photoresist processing, Image processing, Reflectivity, Interferometry, Reflection, Photoresist materials, Semiconducting wafers, Optics manufacturing

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Proceedings Article | 30 July 2002 Paper

High-NA lithographic imagery at Brewster's angle

Timothy Brunner, Nakgeuon Seong, William Hinsberg, John Hoffnagle, Frances Houle, Martha Sanchez

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474473

KEYWORDS: Polarization, Lithography, Reflectivity, Photoresist processing, Reflection, Interferometry, Image processing, Photoresist materials, Optics manufacturing, Semiconducting wafers

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Proceedings Article | 24 July 2002 Paper

High numerical aperture: imaging implications for chemically amplified photoresists

Martha Sanchez, Frances Houle, John Hoffnagle, Timothy Brunner, William Hinsberg

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474233

KEYWORDS: Polarization, Scanning electron microscopy, Lithography, Photoresist materials, Interferometry, Systems modeling, Imaging spectroscopy, Electron microscopes, Antireflective coatings, Image acquisition

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Proceedings Article | 16 July 2002 Paper

Carbon nanotube scanning probe for surface profiling of DUV and 193-nm photoresist pattern

Cattien Nguyen, Ramsey Stevens, Jabulani Barber, Jie Han, Meyya Meyyappan, Martha Sanchez, Carl Larson, William Hinsberg

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473506

KEYWORDS: Carbon nanotubes, Photoresist materials, Metrology, Atomic force microscopy, Lithography, Semiconductors, Silicon, Chemical vapor deposition, Profiling, Scanning electron microscopy

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Proceedings Article | 1 July 2002 Paper

EUV photoresist performance results from the VNL and the EUV LLC

Jonathan Cobb, Paul Dentinger, Luke Hunter, Donna O'Connell, Gregg Gallatin, William Hinsberg, Frances Houle, Martha Sanchez, Wolf-Dieter Domke, Stefan Wurm, Uzodinma Okoroanyanwu, Sang Hun Lee

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472316

KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Photoresist materials, Scanning electron microscopy, Extreme ultraviolet, Photoresist processing, Semiconducting wafers, Deep ultraviolet, Semiconductors, Photoresist developing

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Proceedings Article | 23 June 2000 Paper

Real-time analysis of volatiles formed during processing of a chemically amplified resist

Frances Houle, G. Poliskie, William Hinsberg, Dean Pearson, Martha Sanchez, Hiroshi Ito, John Hoffnagle

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388301

KEYWORDS: Ions, Polymers, Chemical analysis, Chemistry, Ionization, Spectroscopy, Molecules, Mass spectrometry, Nitrogen, Chemically amplified resists

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Proceedings Article | 23 June 2000 Paper

Effect of resist components on image spreading during postexposure bake of chemically amplified resists

William Hinsberg, Frances Houle, Martha Sanchez, Michael Morrison, Gregory Wallraff, Carl Larson, John Hoffnagle, Phillip Brock, Gregory Breyta

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388294

KEYWORDS: Diffusion, Polymers, Chemistry, Photoresist processing, Image processing, Chemically amplified resists, Temperature metrology, Polymer thin films, Chemical analysis, Lithography

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Proceedings Article | 11 June 1999 Paper

Aerial image contrast using interferometric lithography: effect on line-edge roughness

Martha Sanchez, William Hinsberg, Frances Houle, John Hoffnagle, Hiroshi Ito, Cattien Nguyen

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350198

KEYWORDS: Line edge roughness, Lithography, Polymers, Interferometry, Photoresist materials, Scanning electron microscopy, Image analysis, Semiconducting wafers, Chemistry, Modulation

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Proceedings Article | 11 June 1999 Paper

Experimental method for quantifying acid diffusion in chemically amplified resists

Gregory Wallraff, William Hinsberg, Frances Houle, Mons Morrison, Carl Larson, Martha Sanchez, John Hoffnagle, Phillip Brock, Gregory Breyta

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350196

KEYWORDS: Diffusion, Polymers, Polymer thin films, Image processing, Chemistry, Chemically amplified resists, Systems modeling, Quantum efficiency, Semiconducting wafers, 3D image processing

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Proceedings Article | 15 September 1993 Paper

Base-catalyzed photosensitive polyimide

Dennis McKean, Gregory Wallraff, Willi Volksen, Nigel Hacker, Martha Sanchez, Jeff Labadie

Proceedings Volume 1925, (1993) https://doi.org/10.1117/12.154807

KEYWORDS: Polymers, Deep ultraviolet, Chemistry, Absorption, Image processing, Infrared radiation, Imaging systems, Sodium, Spectroscopy, Optical filters

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Showing 5 of 38 publications

Proceedings Volume Editor (7)

SPIE Conference Volume | 21 April 2020

Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020

SPIE Conference Volume | 17 June 2019

Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019

SPIE Conference Volume | 16 July 2018

Novel Patterning Technologies 2018

SPIE Conference Volume | 10 May 2017

Metrology, Inspection, and Process Control for Microlithography XXXI

SPIE Conference Volume | 6 June 2016

Metrology, Inspection, and Process Control for Microlithography XXX

Showing 5 of 7 publications

Conference Committee Involvement (23)

Novel Patterning Technologies 2024

26 February 2024 | San Jose, California, United States

Novel Patterning Technologies 2023

27 February 2023 | San Jose, California, United States

Novel Patterning Technologies 2022

25 April 2022 | San Jose, California, United States

Novel Patterning Technologies 2021

22 February 2021 | Online Only, California, United States

Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020

24 February 2020 | San Jose, California, United States

Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2019

25 February 2019 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXXIII

25 February 2019 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXXII

26 February 2018 | San Jose, California, United States

Novel Patterning Technologies 2018

26 February 2018 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXXI

27 February 2017 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXX

22 February 2016 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXIX

23 February 2015 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXVIII

24 February 2014 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXVII

25 February 2013 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXVI

13 February 2012 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXV

28 February 2011 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXIV

22 February 2010 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXIII

23 February 2009 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXII

25 February 2008 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXI

26 February 2007 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XX

20 February 2006 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XIX

28 February 2005 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XVIII

23 February 2004 | Santa Clara, California, United States

Showing 5 of 23 Conference Committees

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