Dr. Florian Delachat
at CEA-LETI
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | April 10, 2017
Proc. SPIE. 10149, Advanced Etch Technology for Nanopatterning VI
KEYWORDS: Lithography, Electron beam lithography, Etching, Line width roughness, Directed self assembly, Nanoimprint lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers, System on a chip

PROCEEDINGS ARTICLE | March 21, 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Lithography, Polymethylmethacrylate, Polymers, Image processing, Inspection, Scanning electron microscopy, Directed self assembly, Immersion lithography, Picosecond phenomena, Semiconducting wafers

SPIE Journal Paper | October 18, 2016
JM3 Vol. 15 Issue 04
KEYWORDS: Directed self assembly, Optical lithography, Annealing, Picosecond phenomena, Critical dimension metrology, Scanning electron microscopy, Materials processing, Semiconducting wafers, Lithography, Molecular self-assembly

PROCEEDINGS ARTICLE | March 22, 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Lithography, Optical lithography, Defect detection, Etching, Image processing, Annealing, Materials processing, Inspection, Scanning electron microscopy, Photomasks, Directed self assembly, Picosecond phenomena, Critical dimension metrology, Semiconducting wafers, Molecular self-assembly

PROCEEDINGS ARTICLE | October 31, 2012
Proc. SPIE. 8471, Next Generation (Nano) Photonic and Cell Technologies for Solar Energy Conversion III
KEYWORDS: Nanoparticles, Chemical species, Annealing, Luminescence, Crystals, Dielectrics, Silicon, Transmission electron microscopy, Raman spectroscopy, Silicon films

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