Dr. R. Joseph Kline
Materials Research Engineer at National Institute of Standards and Technology
SPIE Involvement:
Conference Program Committee | Author
Publications (19)

SPIE Journal Paper | 3 April 2023 Open Access
JM3, Vol. 22, Issue 03, 031206, (April 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.3.031206
KEYWORDS: X-rays, Scattering, Metrology, Semiconductors, Critical dimension metrology, Lithography, Industry, Standards development, 3D metrology, Nanostructures

Proceedings Article | 28 April 2020 Open Access Presentation
Proceedings Volume 11323, 113232N (2020) https://doi.org/10.1117/12.2572270

Proceedings Article | 20 March 2020 Paper
Proceedings Volume 11325, 113250W (2020) https://doi.org/10.1117/12.2553371
KEYWORDS: Field effect transistors, Etching, Diffraction, X-rays, Metrology, Scattering, Data modeling, Critical dimension metrology, X-ray characterization, Nanostructures

SPIE Journal Paper | 28 January 2020
Mika Pflüger, R. Joseph Kline, Analía Fernández Herrero, Martin Hammerschmidt, Victor Soltwisch, Michael Krumrey
JM3, Vol. 19, Issue 01, 014001, (January 2020) https://doi.org/10.1117/12.10.1117/1.JMM.19.1.014001
KEYWORDS: Diffraction, Scattering, X-rays, Diffraction gratings, Monte Carlo methods, Optical lithography, Metrology, Silicon, Sensors, Manufacturing

SPIE Journal Paper | 3 November 2018
JM3, Vol. 17, Issue 04, 044002, (November 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.4.044002
KEYWORDS: Scattering, Nanostructures, X-rays, Silicon, Semiconductors, System on a chip, Time metrology, Laser scattering, Visualization, Computer simulations

Showing 5 of 19 publications
Conference Committee Involvement (1)
Metrology, Inspection, and Process Control XXXVIII
26 February 2024 | San Jose, California, United States
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