Mr. Hojune Lee
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | April 6, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Multilayers, Sputter deposition, Silicon, Manufacturing, Reflectivity, Ion beams, Photomasks, Extreme ultraviolet, Semiconducting wafers, EUV optics

PROCEEDINGS ARTICLE | September 16, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Electron beams, Thermal effects, Finite element methods, Photomasks, Chemical analysis, Beam shaping, Chemical reactions, Critical dimension metrology, Heat flux, Vestigial sideband modulation

PROCEEDINGS ARTICLE | July 28, 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Electron beam lithography, Backscatter, Scattering, Calibration, Image processing, Laser scattering, Monte Carlo methods, Photomasks, Vestigial sideband modulation, Beam controllers

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Electron beams, Curium, Etching, Ions, Chromium, Photomasks, Plasma etching, Critical dimension metrology, Photoresist processing, Information operations

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Semiconductors, Manufacturing, Computer simulations, Photomasks, Optical proximity correction, Mask making, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Tolerancing

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Light sources, Particles, Inspection, Printing, Photomasks, Optical simulations, SRAF, Mask making, Semiconducting wafers, Laser systems engineering

Showing 5 of 10 publications
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