Hojune Lee
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Publications (11)

Proceedings Article | 10 April 2024 Presentation
Proceedings Volume PC12956, PC1295605 (2024) https://doi.org/10.1117/12.3009572
KEYWORDS: Extreme ultraviolet, Logic

Proceedings Article | 6 April 2015 Paper
Patrick Kearney, Tat Ngai, Anil Karumuri, Jung Yum, Hojune Lee, David Gilmer, Tuan Vo, Frank Goodwin
Proceedings Volume 9422, 94220H (2015) https://doi.org/10.1117/12.2087773
KEYWORDS: Photomasks, Extreme ultraviolet, Reflectivity, Sputter deposition, Multilayers, Semiconducting wafers, Ion beams, Manufacturing, Silicon, EUV optics

Proceedings Article | 16 September 2014 Paper
Jongsu Kim, Jihoon Kang, Inhwan Noh, Sookhyun Lee, Soeun Shin, Sungil Lee, Hyunchung Ha, Hojune Lee, Jin Choi, Sanghee Lee, Inkyun Shin, Shuichi Tamamushi, Chan-Uk Jeon
Proceedings Volume 9235, 92350Y (2014) https://doi.org/10.1117/12.2065930
KEYWORDS: Finite element methods, Critical dimension metrology, Vestigial sideband modulation, Photomasks, Beam shaping, Chemical reactions, Electron beams, Heat flux, Chemical analysis, Thermal effects

Proceedings Article | 28 July 2014 Paper
Proceedings Volume 9256, 925606 (2014) https://doi.org/10.1117/12.2069731
KEYWORDS: Photomasks, Vestigial sideband modulation, Electron beam lithography, Scattering, Laser scattering, Monte Carlo methods, Image processing, Backscatter, Beam controllers, Calibration

Proceedings Article | 30 October 2007 Paper
Proceedings Volume 6730, 67302Z (2007) https://doi.org/10.1117/12.746810
KEYWORDS: Etching, Critical dimension metrology, Chromium, Photomasks, Curium, Ions, Electron beams, Plasma etching, Photoresist processing, Information operations

Showing 5 of 11 publications
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