Byung Gook Kim
SPIE Involvement:
Conference Program Committee | Author
Area of Expertise:
Photomask technology , Electron beam lithography , EUV mask
Publications (50)

Proceedings Article | 15 September 2022 Presentation
Proceedings Volume PC12325, PC123250F (2022)

Proceedings Article | 30 September 2021 Presentation
Proceedings Volume 11855, 118550F (2021)
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Transmittance, Semiconductors, Reflectivity, Photoresist processing, Phase measurement, Pellicles, Microscopes

Proceedings Article | 13 July 2017 Paper
Jongju Park, Jongin Moon, Suein Son, Donghoon Chung, Byung-Gook Kim, Chan-Uk Jeon, Patrick LoPresti, Shan Xue, Sonny Wang, Bill Broadbent, Soonho Kim, Jiuk Hur, Min Choo
Proceedings Volume 10454, 104540J (2017)
KEYWORDS: Databases, Photomasks, Lithography, Inspection, Data processing

Proceedings Article | 17 November 2016 Paper
Proceedings Volume 9985, 99851S (2016)
KEYWORDS: Photomasks, Etching, Plasma, Chromium, Argon, Dry etching, Chlorine, Emission spectroscopy, Critical dimension metrology, Plasma etching

Proceedings Article | 20 May 2016 Paper
Jung-Jin Kim, Junyoul Choi, Soowan Koh, Minho Kim, Jiyoung Lee, Han-Shin Lee, Byung Gook Kim, Chan-uk Jeon
Proceedings Volume 9984, 99840W (2016)
KEYWORDS: Air contamination, Photomasks, Molybdenum, Ions, Transmission electron microscopy, Silicon, Critical dimension metrology, Wet etching, Scanners, Pellicles

Showing 5 of 50 publications
Conference Committee Involvement (13)
Photomask Technology 2024
29 September 2024 | Monterey, California, United States
Photomask Technology 2023
2 October 2023 | Monterey, California, United States
Photomask Technology 2022
26 September 2022 | Monterey, California, United States
Photomask Technology
27 September 2021 | Online Only, United States
Photomask Technology
21 September 2020 | Online Only, California, United States
Showing 5 of 13 Conference Committees
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