Dr. Peng Xie
at Applied Materials Inc
SPIE Involvement:
Publications (15)

Proceedings Article | 2 April 2014 Paper
Nadine Alexis, Chris Bencher, Yongmei Chen, Huixiong Dai, Kfir Dotan, Dale Huang, Alison Nalven, Chris Ngai, Gaetano Santoro, Bharath Vijayaraghavan, Peng Xie, Jun Xue
Proceedings Volume 9050, 905030 (2014) https://doi.org/10.1117/12.2048356
KEYWORDS: Inspection, Polarization, Extreme ultraviolet, Semiconducting wafers, Extreme ultraviolet lithography, Lithography, Photomasks, Signal to noise ratio, Wafer inspection, Metrology

Proceedings Article | 27 March 2014 Paper
Linus Jang, Young Joon Moon, Ryoung-Han Kim, Christopher Bencher, Huixiong Dai, Peng Xie, Daniel Diehl, Yong Cao, Wilson Zeng, Christopher Ngai
Proceedings Volume 9051, 90510Y (2014) https://doi.org/10.1117/12.2046107
KEYWORDS: Photoresist materials, Optical lithography, Etching, Lithography, Semiconducting wafers, Silicon, System on a chip, Double patterning technology, Manufacturing, Reflectivity

Proceedings Article | 12 April 2013 Paper
Proceedings Volume 8683, 86831Y (2013) https://doi.org/10.1117/12.2011505
KEYWORDS: Line edge roughness, Photomasks, Nanoimprint lithography, Image filtering, Lithography, Semiconducting wafers, Projection lithography, Critical dimension metrology, Diffraction, Image processing

Proceedings Article | 29 March 2013 Paper
Tristan Ma, Peng Xie, Ludovic Godet, Patrick Martin, Chris Campbell, Jun Xue, Liyan Miao, Yongmei Chen, Huixiong Dai, Christopher Bencher, Chris Ngai
Proceedings Volume 8682, 868206 (2013) https://doi.org/10.1117/12.2013435
KEYWORDS: Ion implantation, Plasma, Semiconducting wafers, Line edge roughness, Etching, Ions, Line width roughness, Photoresist materials, Extreme ultraviolet, Plasma etching

Proceedings Article | 29 March 2013 Paper
Peng Xie, He Ren, Aneesh Nainani, Huixiong Dai, Chris Bencher, Chris Ngai
Proceedings Volume 8684, 86840J (2013) https://doi.org/10.1117/12.2013495
KEYWORDS: Line edge roughness, Line width roughness, Dielectric breakdown, Dielectrics, Spatial frequencies, Reliability, Lithography, TCAD, Neodymium

Showing 5 of 15 publications
  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top