Simon Hsieh
Marketing at ASML CLS
SPIE Involvement:
Publications (6)

Proceedings Article | 18 March 2019 Presentation
Proceedings Volume 10961, 109610J (2019)
KEYWORDS: Critical dimension metrology, Light sources, Semiconducting wafers, Yield improvement, Deep ultraviolet, Scanners, Control systems, Source mask optimization

Proceedings Article | 30 March 2017 Presentation + Paper
Proceedings Volume 10147, 1014707 (2017)
KEYWORDS: Light sources, Process control, Image processing, Source mask optimization, Lithography, Critical dimension metrology, Optical proximity correction, Control systems, Overlay metrology, Optical lithography, Eye, Metrology, Electroluminescence

Proceedings Article | 4 September 2015 Paper
Proceedings Volume 9661, 966105 (2015)
KEYWORDS: Light sources, Semiconducting wafers, Optical lithography, Critical dimension metrology, Logic, Line width roughness, Optical proximity correction, Metals, Scanners, Modulation

Proceedings Article | 18 March 2015 Paper
Proceedings Volume 9426, 942607 (2015)
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Scanners, Lithography, Control systems, Yield improvement, Optical proximity correction, Overlay metrology, Process control, Metals

Proceedings Article | 12 December 2009 Paper
Tsung-Chih Chien, C. Y. Shih, R. C. Peng, H. H. Liu, Y. C. Chen, H. J. Lee, John Lin, K. W. Chang, C. M. Wu, W. H. Hung, Tommy Lee, H. C. Wu, X. Xie, W. J. Shao, C. H. Chang, R. Aldana, Y. Cao, R. Goossens, Simon Hsieh
Proceedings Volume 7520, 75201Q (2009)
KEYWORDS: Scanners, Semiconducting wafers, Calibration, Lithography, Yield improvement, Model-based design, Data modeling, Wafer-level optics, Optimization (mathematics), Process modeling

Showing 5 of 6 publications
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