Dr. Junghyung Lee Profile

Dr. Junghyung Lee

Senior Engineer at SK Hynix Inc

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Author

Publications (8)

Proceedings Article | 26 March 2019 Presentation + Paper

Staggered pillar patterning using 0.33NA EUV lithography

Danilo De Simone, Romuald Blanc, Jeroen Van de Kerkhove, Amir-Hossein Tamaddon, Roberto Fallica, Lieve Van Look, Nouredine Rassoul, Frederic Lazzarino, Nadia Vandenbroeck, Pieter Vanelderen, Gian Lorusso, Frieda Van Roey, Anne-Laure Charley, Geert Vandenberghe, Kurt Ronse, Kilyoung Lee, Junghyung Lee, Sarohan Park, Chang-Moon Lim, Chan-Ha Park

Proceedings Volume 10957, 109570T (2019) https://doi.org/10.1117/12.2515170

KEYWORDS: Optical lithography, Extreme ultraviolet lithography, Semiconducting wafers, Etching, Extreme ultraviolet, Critical dimension metrology, Image processing, Failure analysis, Scanning electron microscopy, Image analysis

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Proceedings Article | 18 March 2016 Paper

Extension of practical k1 limit in EUV lithography

Sarohan Park, Inwhan Lee, Sunyoung Koo, Junghyung Lee, Chang-Moon Lim

Proceedings Volume 9776, 97761Q (2016) https://doi.org/10.1117/12.2219546

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Optical lithography, Nanoimprint lithography, Lithographic illumination, Source mask optimization, Resolution enhancement technologies, Line width roughness, Stochastic processes, Scanners, Photomasks, Semiconducting wafers, Lithography, Critical dimension metrology

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Proceedings Article | 18 March 2016 Paper

Study on RLS trade-off resist upgrade for production ready EUV lithography

Junghyung Lee, Jieun Kim, Seunguk Jeong, Mijung Lim, Sunyoung Koo, Chang-Moon Lim, Young-Sik Kim

Proceedings Volume 9776, 977623 (2016) https://doi.org/10.1117/12.2219558

KEYWORDS: Extreme ultraviolet, Manufacturing, Neodymium, Nanoimprint lithography, Extreme ultraviolet lithography, Ions, Source mask optimization, Ultraviolet radiation, Line edge roughness, Optical lithography

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Proceedings Article | 17 April 2014 Paper

Comparison of EUV patterning performance between PTD and NTD for 1Xnm DRAM

Changil Oh, Hyungsuk Seo, Eunjoo Park, Junghyung Lee, Cheolkyu Bok, Wontaik Kwon, Sungki Park

Proceedings Volume 9048, 904808 (2014) https://doi.org/10.1117/12.2046624

KEYWORDS: Extreme ultraviolet, Optical lithography, Nanoimprint lithography, Photoresist processing, Semiconducting wafers, Line width roughness, Double patterning technology, Extreme ultraviolet lithography, Absorption, Lithography

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Proceedings Article | 16 April 2011 Paper

Defect printability analysis in negative tone development lithography

Junggun Heo, Changil Oh, Junghyung Lee, Minkyung Park, Hyungsuk Seo, Cheolkyu Bok, Donggyu Yim, Sungki Park

Proceedings Volume 7972, 79721K (2011) https://doi.org/10.1117/12.871048

KEYWORDS: Optical lithography, Lithography, Etching, Photomasks, Image processing, Semiconducting wafers, Image enhancement, Photoresist processing, Electroluminescence, Resistance

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Proceedings Article | 31 March 2010 Paper

Mesh patterning process for 40nm contact hole

Kilyoung Lee, Cheolkyu Bok, Jaeheon Kim, Hyunkyung Shim, Junggun Heo, Junghyung Lee, Hyeong-Soo Kim, Donggu Yim, Sung-Ki Park

Proceedings Volume 7639, 76391S (2010) https://doi.org/10.1117/12.846388

KEYWORDS: Optical lithography, Double patterning technology, Image processing, Photoresist processing, Lithography, Etching, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Coating

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Proceedings Article | 26 March 2010 Paper

Topcoat-less resist process for 2Xnm node devices

Changil Oh, Junghyung Lee, Junggun Heo, Hyunkyung Shim, Keundo Ban, Cheolkyu Bok, Donggyu Yim, Sungki Park

Proceedings Volume 7639, 76393A (2010) https://doi.org/10.1117/12.846707

KEYWORDS: Photoresist processing, Line width roughness, Immersion lithography, Scanners, Optical lithography, Bridges, Semiconducting wafers, Etching, Photomasks, Materials processing

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Proceedings Article | 26 March 2008 Paper

Optimization of BARC process for hyper-NA immersion lithography

Kilyoung Lee, Junghyung Lee, Sungkoo Lee, Dongheok Park, Cheolkyu Bok, Seungchan Moon

Proceedings Volume 6923, 69232R (2008) https://doi.org/10.1117/12.771957

KEYWORDS: Reflectivity, Photoresist materials, Etching, Immersion lithography, System on a chip, Lithography, Polarization, Carbon, Process control, Polymers

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Showing 5 of 8 publications

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