Dr. Jing Xue
at
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Optical lithography, Cadmium, Calibration, Scanning electron microscopy, Printing, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Binary data

PROCEEDINGS ARTICLE | September 29, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Calibration, Control systems, Scanning electron microscopy, Process control, Photomasks, Optical simulations, Integrated optics, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 4, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Optical lithography, Data modeling, Calibration, Etching, Inspection, Optical proximity correction, Semiconducting wafers, Performance modeling, Process modeling

PROCEEDINGS ARTICLE | March 24, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Interferometers, Sensors, Calibration, Fourier transforms, Scatterometry, Critical dimension metrology, Spherical lenses, Semiconducting wafers, Scatter measurement, Phase shifts

PROCEEDINGS ARTICLE | March 4, 2008
Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II
KEYWORDS: Lithography, Optical design, Metrology, Spatial frequencies, Composites, Pellicles, Scatterometry, Optical simulations, Binary data, Phase shifts

PROCEEDINGS ARTICLE | November 1, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Metrology, Data modeling, Calibration, Scatterometry, Finite element methods, Critical dimension metrology, Panoramic photography, Semiconducting wafers, Scatter measurement, Phase shifts

Showing 5 of 8 publications
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