Dr. Jing Xue
SPIE Involvement:
Publications (10)

Proceedings Article | 13 June 2022 Presentation
Yuping Cui, Jing Xue, Jing Sha, Zheng Guo Chen, Larry Zhuang, Derren Dunn, Jeffrery Shearer, Li-Jin Chen, Rich Wu, Charlie King
Proceedings Volume 12052, 120520R (2022) https://doi.org/10.1117/12.2614060
KEYWORDS: Optical proximity correction, Machine learning, Data modeling, Neural networks, Process modeling, Photomasks, Wafer-level optics, Semiconducting wafers, Lithography, Photoresist processing

Proceedings Article | 17 April 2020 Presentation + Paper
Cheng Chi, Hao Tang, Oseo Park, Jing Xue, Jing Guo, Geng Han, Charlie King, Jeff Shearer, Sean Burns
Proceedings Volume 11327, 113270E (2020) https://doi.org/10.1117/12.2550834
KEYWORDS: SRAF, Photomasks, Semiconducting wafers, Optical proximity correction, Data modeling, Yield improvement, Optics manufacturing, Optical lithography, Deep ultraviolet, Logic

Proceedings Article | 13 March 2012 Paper
Proceedings Volume 8326, 83261D (2012) https://doi.org/10.1117/12.916466
KEYWORDS: SRAF, Semiconducting wafers, Binary data, Printing, Optical proximity correction, Calibration, Photomasks, Scanning electron microscopy, Cadmium, Optical lithography

Proceedings Article | 29 September 2010 Paper
Proceedings Volume 7823, 782341 (2010) https://doi.org/10.1117/12.866197
KEYWORDS: Photomasks, Optical proximity correction, Critical dimension metrology, Integrated optics, Calibration, Semiconducting wafers, Optical simulations, Process control, Control systems, Scanning electron microscopy

Proceedings Article | 4 March 2010 Paper
Proceedings Volume 7640, 76402Q (2010) https://doi.org/10.1117/12.846683
KEYWORDS: Etching, Data modeling, Lithography, Optical proximity correction, Calibration, Inspection, Performance modeling, Optical lithography, Semiconducting wafers, Process modeling

Showing 5 of 10 publications
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