Dr. Peter De Bisschop
Senior Researcher at imec
SPIE Involvement:
Area of Expertise:
lithography , stochastics , DTCO , imaging , EUVL , simulations
Profile Summary

Peter De Bisschop received his PhD in physics from Leuven University, Belgium, with a Ph.D. thesis on hyperfine interactions of short-living Sr isotopes.
He moved to imec in 1986, where he worked on the development of a laser-assisted SIMS technique in the Materials Analysis department..
In 1995, he joined the Lithography Department. He worked on diverse topics related to exposure-tool-control and -qualification, imaging, masks, rigorous simulations, OPC, and DTCO. His focus in the past few years has been on stochastic effects in EUVL.
During the past 25 years, he has also been involved in a lithography-teaching program that imec provides to some of its member companies.
Publications (86)

Proceedings Article | 21 November 2023 Presentation + Paper
Proceedings Volume 12750, 1275006 (2023) https://doi.org/10.1117/12.2685543
KEYWORDS: Semiconducting wafers, Stochastic processes, Nanoimprint lithography, Printing, Line width roughness, Simulations, Optical lithography, Extreme ultraviolet lithography, Scanning electron microscopy, Extreme ultraviolet

Proceedings Article | 28 April 2023 Poster + Paper
Proceedings Volume 12494, 1249419 (2023) https://doi.org/10.1117/12.2658651
KEYWORDS: Failure analysis, Stochastic processes, Monte Carlo methods, Extreme ultraviolet lithography, Extreme ultraviolet, Statistical analysis, Optical proximity correction, Error analysis

SPIE Journal Paper | 8 August 2022
Peter De Bisschop, Steven G. Hansen
JM3, Vol. 21, Issue 03, 033201, (August 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.3.033201
KEYWORDS: Critical dimension metrology, Optical correlators, Data modeling, Stochastic processes, Metrology, Semiconducting wafers, Calibration, Extreme ultraviolet, Photomasks, Finite element methods

Proceedings Article | 26 May 2022 Presentation + Paper
Proceedings Volume 12053, 120530Z (2022) https://doi.org/10.1117/12.2615955
KEYWORDS: Semiconducting wafers, Error analysis, Metrology, Scanners, Data modeling, Extreme ultraviolet lithography, Extreme ultraviolet, Wavefronts, Modulation, Wavefront aberrations

Proceedings Article | 26 May 2022 Presentation + Paper
Proceedings Volume 12051, 1205105 (2022) https://doi.org/10.1117/12.2614142
KEYWORDS: Stochastic processes, Line edge roughness, Calibration, Line width roughness, Extreme ultraviolet, Statistical analysis, Diffusion, Photoresist processing, Monte Carlo methods, Extreme ultraviolet lithography

Showing 5 of 86 publications
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