Dr. Weimin Gao
Manager at ASML
SPIE Involvement:
Publications (28)

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12495, 1249509 (2023) https://doi.org/10.1117/12.2658871
KEYWORDS: Metals, Extreme ultraviolet, Source mask optimization, Nanoimprint lithography, Personal protective equipment, Critical dimension metrology, Logic, Optical lithography, Surface plasmons, Lithography

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12051, PC1205105 (2022) https://doi.org/10.1117/12.2614162
KEYWORDS: Photomasks, Ecosystems, Optical lithography, Extreme ultraviolet, Reticles, Scanners, Metrology, Extreme ultraviolet lithography, Etching, Thin films

Proceedings Article | 26 May 2022 Presentation + Paper
Proceedings Volume 12052, 120520G (2022) https://doi.org/10.1117/12.2614225
KEYWORDS: Source mask optimization, Metals, Nanoimprint lithography, Extreme ultraviolet, Photomasks, Logic, Optical lithography, Molybdenum, SRAF, Extreme ultraviolet lithography

Proceedings Article | 2 April 2020 Presentation + Paper
Proceedings Volume 11323, 113231L (2020) https://doi.org/10.1117/12.2552888
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Logic, Optical lithography, Photomasks, Resolution enhancement technologies, Source mask optimization, Optical proximity correction, Metals, Nanoimprint lithography

Proceedings Article | 19 March 2018 Presentation + Paper
Proceedings Volume 10583, 105830O (2018) https://doi.org/10.1117/12.2297677
KEYWORDS: Photomasks, Optical proximity correction, Double patterning technology, Lithography, Extreme ultraviolet lithography, Image processing

Showing 5 of 28 publications
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