Mr. Douglas J. Van Den Broeke
Senior Director at ASML Brion
SPIE Involvement:
Author
Publications (73)

PROCEEDINGS ARTICLE | May 27, 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Metrology, Optical lithography, Scattering, Manufacturing, Time metrology, Photomasks, Extreme ultraviolet, Computational lithography, Critical dimension metrology, EUV optics

PROCEEDINGS ARTICLE | April 4, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Mathematical modeling, Lithography, Data modeling, Imaging systems, Calibration, Image processing, Design for manufacturing, Photomasks, Optical proximity correction, Statistical modeling

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Optical lithography, Etching, Manufacturing, Printing, Photomasks, Double patterning technology, Optical proximity correction, Critical dimension metrology, Photoresist processing, Model-based design

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Data modeling, Calibration, Scanners, Manufacturing, Design for manufacturing, Photomasks, Optical proximity correction, Process modeling, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Optical lithography, Imaging systems, Etching, Quartz, Printing, Photomasks, Optical proximity correction, Mask making, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Diffraction, Optical lithography, Metals, Manufacturing, Printing, Photomasks, Optical proximity correction, Nanoimprint lithography, Resolution enhancement technologies

Showing 5 of 73 publications
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