Dr. Anton B. van Oosten
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Electron beam lithography, Metrology, Deep ultraviolet, Inspection, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Stochastic processes

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Photon counting, Metrology, Data modeling, Deep ultraviolet, Metals, Scanners, Photons, Printing, Projection systems, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, High volume manufacturing, Semiconducting wafers, Absorption, Chemically amplified resists

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Diffraction, Mirrors, Inspection, Printing, Photomasks, Extreme ultraviolet, Nanoimprint lithography, Semiconducting wafers, Prototyping, 3D image processing

PROCEEDINGS ARTICLE | September 4, 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Diffraction, Mirrors, Inspection, Printing, Photomasks, Extreme ultraviolet, Nanoimprint lithography, Semiconducting wafers, Prototyping, 3D image processing

PROCEEDINGS ARTICLE | July 9, 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Diffraction, Mirrors, Reflectivity, Printing, Photomasks, Extreme ultraviolet, Nanoimprint lithography, Semiconducting wafers, Prototyping, 3D image processing

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Apodization, Multilayers, Scanners, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Photoresist processing, Semiconducting wafers

Showing 5 of 10 publications
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