Hiroshi Mohri
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Publications (83)

Proceedings Article | 28 June 2013 Paper
Tsukasa Abe, Yuichi Inazuki, Yukie Kobayashi, Yasutaka Morikawa, Hiroshi Mohri, Naoya Hayashi
Proceedings Volume 8701, 87010R (2013) https://doi.org/10.1117/12.2030183
KEYWORDS: Photomasks, Etching, Extreme ultraviolet, Extreme ultraviolet lithography, Dry etching, Optical lithography, Inspection, Photoresist processing, Chromium, Wet etching

Proceedings Article | 7 April 2011 Paper
Proceedings Volume 7969, 79691B (2011) https://doi.org/10.1117/12.879565
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Defect detection, Lithography, Manufacturing, Particles, Electronic components, Opacity

Proceedings Article | 2 April 2011 Paper
Naoya Hayashi, Tsukasa Abe, Takeya Shimomura, Yuichi Inazuki, Tadahiko Takikawa, Hiroshi Mohri
Proceedings Volume 7985, 798505 (2011) https://doi.org/10.1117/12.896886
KEYWORDS: Photomasks, Inspection, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Defect inspection, EUV optics, Reflectivity, Optics manufacturing, Mask cleaning

Proceedings Article | 25 September 2010 Paper
Proceedings Volume 7823, 782306 (2010) https://doi.org/10.1117/12.868534

Proceedings Article | 25 September 2010 Paper
Yuichi Inazuki, Takeya Shimomura, Tsukasa Abe, Taichi Ogase, Satoshi Kawashima, Tadahiko Takigawa, Hiroshi Mohri, Naoya Hayashi
Proceedings Volume 7823, 78231W (2010) https://doi.org/10.1117/12.869592
KEYWORDS: Line width roughness, Image segmentation, Photomasks, Optical lithography, Extreme ultraviolet lithography, Scanning electron microscopy, Extreme ultraviolet, Semiconducting wafers, Polymers, Optical properties

Showing 5 of 83 publications
Conference Committee Involvement (1)
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
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