Mr. Hiroshi Mohri
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Conference Program Committee | Author
Publications (83)

PROCEEDINGS ARTICLE | June 28, 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Optical lithography, Etching, Dry etching, Inspection, Chromium, Photomasks, Extreme ultraviolet, Wet etching, Extreme ultraviolet lithography, Photoresist processing

PROCEEDINGS ARTICLE | April 7, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Defect detection, Opacity, Particles, Manufacturing, Inspection, Electronic components, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | April 2, 2011
Proc. SPIE. 7985, 27th European Mask and Lithography Conference
KEYWORDS: Lithography, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optics manufacturing, Mask cleaning, EUV optics, Defect inspection

PROCEEDINGS ARTICLE | September 25, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Defect detection, Opacity, Inspection, Scanning electron microscopy, Optical inspection, Bridges, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Defect inspection

PROCEEDINGS ARTICLE | September 25, 2010
Proc. SPIE. 7823, Photomask Technology 2010

PROCEEDINGS ARTICLE | September 25, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Optical lithography, Optical properties, Polymers, Image segmentation, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers

Showing 5 of 83 publications
Conference Committee Involvement (1)
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
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