Dr. Theodore H. Fedynyshyn
Senior Staff Member at MIT Lincoln Lab
SPIE Involvement:
Fellow status | Conference Chair | Author | Editor
Publications (43)

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Electron beam lithography, Etching, Silicon, Resistance, Photoresist materials, Maskless lithography, Microfabrication, Critical dimension metrology, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Data modeling, Deep ultraviolet, Reflectivity, Photoresist materials, Photomasks, Extreme ultraviolet, Aluminum, Extreme ultraviolet lithography, Semiconducting wafers, Plasma

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7637, Alternative Lithographic Technologies II
KEYWORDS: Lithography, Nanostructures, Electron beam lithography, Polymers, Silicon, Scanning electron microscopy, Picosecond phenomena, Photomicroscopy, Semiconducting wafers, Polymer thin films

PROCEEDINGS ARTICLE | March 26, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Polymethylmethacrylate, Polymers, Quantum efficiency, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Photochemistry, Semiconducting wafers, Polymer thin films, EUV optics

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Statistical analysis, Modulation, Polymers, Surface roughness, Distortion, Atomic force microscopy, Profiling, Shape analysis, Line edge roughness, Photoresist processing

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Polymers, Diffusion, Surface roughness, Atomic force microscopy, Profiling, Line width roughness, Line edge roughness, Photoresist processing, Polymer thin films

Showing 5 of 43 publications
Conference Committee Involvement (2)
Advances in Resist Technology and Processing XX
24 February 2003 | Santa Clara, California, United States
Advances in Resist Technology and Processing XIX
4 March 2002 | Santa Clara, California, United States
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