Dr. Yuichi Yoshida
at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | March 20, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Optical lithography, Polymers, Capillaries, Particles, NOx, Bridges, Photoresist processing, Semiconducting wafers, Yield improvement, Wafer manufacturing

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Water, Coating, Surface properties, Line width roughness, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Polymers, Image processing, Materials processing, Dynamic light scattering, Photoresist materials, Photomasks, Photoresist processing, Semiconducting wafers, Photoresist developing

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Electron beams, Etching, Quartz, Manufacturing, Inspection, Photomasks, Nanoimprint lithography, Photoresist processing, Semiconducting wafers, Vestigial sideband modulation

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Ultrafast phenomena, Scattering, Signal attenuation, Quartz, Laser applications, Laser scattering, Photomasks, Critical dimension metrology, Semiconducting wafers, Binary data

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Etching, Quartz, Scanning electron microscopy, Photomasks, Beam shaping, Nanoimprint lithography, Line edge roughness, Photoresist processing, Vestigial sideband modulation

Showing 5 of 9 publications
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