Ms. Nicola Nadia Kissoon Profile

Nicola Nadia Kissoon

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Publications (6)

SPIE Journal Paper | 19 October 2023

Voltage contrast determination of design rules at the limits of EUV single patterning

Victor Blanco Carballo, Etienne De Poortere, Philippe Leray, Dorin Cerbu, Jeroen van de Kerkhove, Nicola Kissoon

JM3, Vol. 22, Issue 04, 041604, (October 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.041604

KEYWORDS: Metals, Design rules, Design, Critical dimension metrology, Scanning electron microscopy, Diffractive optical elements, Extreme ultraviolet, Etching, Optical lithography, Transmission electron microscopy

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Proceedings Article | 1 December 2022 Presentation + Paper

Image contrast metrology for EUV lithography

Timothy Brunner, Vincent Truffert, Christopher Ausschnitt, Nicola Kissoon, Edouard Duriau, Tom Jonckers, Lieve van Look, Joern-Holger Franke

Proceedings Volume 12292, 122920A (2022) https://doi.org/10.1117/12.2640647

KEYWORDS: Photoresist processing, Metrology, Stochastic processes, Extreme ultraviolet lithography, Lithographic process control

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Proceedings Article | 12 October 2021 Presentation + Paper

28nm-pitch Ru interconnects patterned with a 0.33NA-EUV single exposure

Sayantan Das, Nicola Kissoon, Mahmudul Hasan, Luc Rynders, Luka Kljucar, Sandip Halder, Philippe Leray, Mircea Dusa, David Rio, Mahmoud Mohsen, Chris Spence, Etienne De Poortere

Proceedings Volume 11854, 118540C (2021) https://doi.org/10.1117/12.2600937

KEYWORDS: Stochastic processes, Semiconducting wafers, Ruthenium, Inspection, Extreme ultraviolet lithography, Line edge roughness

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Proceedings Article | 22 February 2021 Presentation

Electrical validation of massive E-beam defect metrology in EUV-patterned interconnects

Nicola Kissoon, Etienne De Poortere, David Hellin, Stefan Decoster, Gayle Murdoch, Stephane Lariviere, Elisabeth Camerotto, Sandip Halder, Philippe Leray, Malgorzata Jurczak, Guillaume Schelcher

Proceedings Volume 11611, 116110Q (2021) https://doi.org/10.1117/12.2584807

KEYWORDS: Metrology, Inspection, Ruthenium, Metals, Extreme ultraviolet, Etching, Electron beam lithography, Defect detection

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Proceedings Article | 24 March 2020 Presentation

Holistic litho, films and etch for EUV DRAM storage node pad (Conference Presentation)

Cyrus Tabery, Nader Shamma, Nicola Kissoon, Elisabeth Camerotto, Mircea Dusa, Victor Blanco, Joost Bekaert, Rich Wise, Patrick Jaenen, Moyra McManus

Proceedings Volume 11329, 113290U (2020) https://doi.org/10.1117/12.2569606

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Proceedings Article | 26 March 2019 Presentation + Paper

Impact of sequential infiltration synthesis (SIS) on roughness and stochastic nano-failures for EUVL patterning

Pieter Vanelderen, Victor Blanco, Ming Mao, Yoann Tomczak, David de Roest, Nicola Kissoon, Paulina Rincon Delgadillo, Gijsbert Rispens, Guido Schiffelers, Abhinav Pathak, Frederic Lazzarino, Danilo De Simone, Etienne de Poortere, Moyra Mc Manus, Daniele Piumi, Eric Hendrickx, Geert Vandenberghe

Proceedings Volume 10957, 109570S (2019) https://doi.org/10.1117/12.2515503

KEYWORDS: Etching, Lithography, Extreme ultraviolet lithography, Photoresist materials, Logic, Optical lithography

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Showing 5 of 6 publications

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