Henning Haffner
at Intel Corp
SPIE Involvement:
Publications (12)

SPIE Journal Paper | 19 March 2012
Bradley Morgenfeld, Ian Stobert, Ju Jin An, Massud Aminpur, Colin Brodsky, Alan Thomas, Henning Haffner, Martin Ostermayr, Hideki Kanai, Norman Chen
JM3, Vol. 11, Issue 1, 013010, (March 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.1.013010
KEYWORDS: SRAF, Printing, Optical proximity correction, Optical lithography, Critical dimension metrology, Etching, Logic, Photomasks, Semiconducting wafers, Model-based design

Proceedings Article | 4 April 2011 Paper
Henning Haffner, Martin Ostermayr, Hideki Kanai, Chan Sam Chang, Bradley Morgenfeld, Jujin An, Meng Luo, Haoren Zhuang
Proceedings Volume 7974, 79740E (2011) https://doi.org/10.1117/12.879681
KEYWORDS: Optical proximity correction, Etching, Silicon, Double patterning technology, Oxides, Photomasks, Lithography, Logic, Printing, Semiconducting wafers

Proceedings Article | 23 March 2011 Paper
Proceedings Volume 7973, 79730C (2011) https://doi.org/10.1117/12.879703
KEYWORDS: Source mask optimization, Photomasks, Resolution enhancement technologies, Optical proximity correction, Tolerancing, Optical lithography, SRAF, Image processing, Lithography, Semiconducting wafers

Proceedings Article | 1 April 2008 Paper
Proceedings Volume 6924, 69243C (2008) https://doi.org/10.1117/12.784107
KEYWORDS: Photomasks, Double patterning technology, Logic, Lithography, Etching, Optical lithography, Optical proximity correction, Immersion lithography, Printing, Image processing

Proceedings Article | 7 March 2008 Paper
Chandra Sarma, Allen Gabor, Scott Halle, Henning Haffner, Klaus Herold, Len Tsou, Helen Wang, Haoren Zhuang
Proceedings Volume 6924, 692429 (2008) https://doi.org/10.1117/12.772985
KEYWORDS: Etching, Optical lithography, Double patterning technology, Tolerancing, Image processing, Photomasks, Lithography, Logic devices, Semiconducting wafers, Oxides

Showing 5 of 12 publications
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