Dr. Lei Zhuang
Senior Process Engineer at GLOBALFOUNDRIES Inc
SPIE Involvement:
Publications (10)

Proceedings Article | 22 October 2018 Presentation + Paper
Proceedings Volume 10810, 108100P (2018) https://doi.org/10.1117/12.2501973
KEYWORDS: Photomasks, SRAF, Printing, Lithography, Vestigial sideband modulation, Semiconducting wafers, Optical proximity correction, Manufacturing, Image quality, Image processing

SPIE Journal Paper | 31 July 2018
JM3, Vol. 18, Issue 01, 011003, (July 2018) https://doi.org/10.1117/12.10.1117/1.JMM.18.1.011003
KEYWORDS: SRAF, Photomasks, Metals, Extreme ultraviolet lithography, Personal protective equipment, Photovoltaics, Extreme ultraviolet, Image quality, Source mask optimization, Lithography

Proceedings Article | 19 March 2018 Paper
Proceedings Volume 10583, 105830N (2018) https://doi.org/10.1117/12.2297410
KEYWORDS: SRAF, Photomasks, Extreme ultraviolet lithography, Image quality, Source mask optimization, Optical proximity correction

Proceedings Article | 16 March 2016 Paper
Dongbing Shao, Larry Clevenger, Lei Zhuang, Lars Liebmann, Robert Wong, James Culp
Proceedings Volume 9781, 978106 (2016) https://doi.org/10.1117/12.2218636
KEYWORDS: Monte Carlo methods, Semiconducting wafers, Design for manufacturability, Manufacturing, Semiconductors, Diffractive optical elements, Microelectronics, Protactinium, Process modeling

Proceedings Article | 16 April 2011 Paper
Proceedings Volume 7972, 797206 (2011) https://doi.org/10.1117/12.882843
KEYWORDS: Photoresist developing, Photoresist materials, Polymers, Systems modeling, Semiconducting wafers, Optical lithography, Optical proximity correction, Photomasks, Etching, Nanoimprint lithography

Showing 5 of 10 publications
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