Dr. Jason Meiring
at Mentor Graphics Corp.
SPIE Involvement:
Author
Publications (20)

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Optical lithography, Cadmium, Visualization, Databases, Design for manufacturing, Photomasks, Semiconductor manufacturing, Computational lithography, Optical proximity correction, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Superposition, Lithography, Data modeling, Image processing, 3D modeling, Photomasks, Source mask optimization, Computational lithography, Optical proximity correction, Nanoimprint lithography, Algorithm development, Optimization (mathematics), Performance modeling

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Logic, Visualization, Scanners, Photomasks, Source mask optimization, SRAF, Semiconducting wafers, Back end of line, Fiber optic illuminators

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Photovoltaics, Optical lithography, Aerospace engineering, Visualization, Databases, Metals, Manufacturing, Legal, Optical proximity correction, Resolution enhancement technologies

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Photovoltaics, Data modeling, Image processing, Printing, Photomasks, Source mask optimization, SRAF, Nanoimprint lithography, Binary data, Phase shifts

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Optical lithography, Etching, Polymers, Photoresist materials, Photomasks, Optical proximity correction, Nanoimprint lithography, Semiconducting wafers, Systems modeling, Photoresist developing

Showing 5 of 20 publications
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