Dr. Kostas Adam
VP of Engineering at Synopsys
SPIE Involvement:
Publications (51)

Proceedings Article | 20 March 2020 Presentation + Paper
Proceedings Volume 11325, 1132507 (2020) https://doi.org/10.1117/12.2551082
KEYWORDS: Semiconducting wafers, Data modeling, Overlay metrology, Metals, Metrology, Critical dimension metrology, Databases, Inspection, Computer simulations, Scanners

Proceedings Article | 4 April 2019 Paper
Kostas Adam, Shashidhara Ganjugunte, Clement Moyroud, Kostya Shchehlik, Michael Lam, Andrew Burbine, Germain Fenger, Yuri Granik
Proceedings Volume 10962, 109620F (2019) https://doi.org/10.1117/12.2519848
KEYWORDS: Neural networks, Machine learning, Systems modeling, Optical proximity correction, Data modeling, Process modeling, Calibration, Lithography, Cadmium, Coastal modeling

Proceedings Article | 20 March 2019 Presentation + Paper
Proceedings Volume 10962, 109620B (2019) https://doi.org/10.1117/12.2516101
KEYWORDS: Failure analysis, Critical dimension metrology, Lithography, Logic, Manufacturing, Photomasks, Error analysis, Stochastic processes, Visualization, Optical proximity correction

Proceedings Article | 18 March 2019 Presentation
Proceedings Volume 10961, 109610E (2019) https://doi.org/10.1117/12.2515128
KEYWORDS: Photoresist developing, Lithography, Finite element methods, Process modeling, Photoresist processing, Computer simulations, Chemically amplified resists, Optical lithography, Photoresist materials, 3D modeling

Proceedings Article | 16 October 2017 Paper
Proceedings Volume 10450, 104500V (2017) https://doi.org/10.1117/12.2280548
KEYWORDS: Photomasks, Semiconducting wafers, Optical proximity correction, Finite-difference time-domain method, Wafer-level optics, Systems modeling, Extreme ultraviolet lithography, Projection systems, Scanners, Electromagnetism

Showing 5 of 51 publications
  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top